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Ultrasonic cleaning method and device

An ultrasonic cleaning and ultrasonic technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as complex processes, high cleaning costs, and expensive equipment

Active Publication Date: 2022-05-31
LIAONING TECHNICAL UNIVERSITY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this megasonic cleaning technology is very complicated in process, and the equipment is expensive, which makes the cleaning cost very high.

Method used

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  • Ultrasonic cleaning method and device

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Experimental program
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Embodiment Construction

[0026] Below through the accompanying drawings and examples, the technical scheme of the present invention is described in further detail.

[0037] This step is used to detect whether the plate 200 to be cleaned is cleaned. The plate 200 to be cleaned can be detected by a microscope

[0040] Until step S140, it is detected that the plate 200 to be cleaned has been cleaned, and the execution of step S100-step S150 is terminated.

[0045]

[0046]

[0058] The controller 300 also includes: a liquid supplement controller 40 and a gas supplement controller 30; a liquid supplement controller 40 and a gas supplement controller 30

[0065] In the embodiment of the present invention, the frequency of the ultrasonic parameter controller is selected at 15kHz-5MHz.

[0068] Figure 3 is a spot cleaning. As shown in Figure 3(a), spot cleaning is the first cleaning method.

[0071] In this embodiment, the point cleaning is to clean the part of the plate 200 to be cleaned.

[0072] FIG. 4 is a ...

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PUM

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Abstract

The present invention relates to an ultrasonic cleaning method and device. The ultrasonic cleaning method is applied to an ultrasonic cleaning device mainly composed of an ultrasonic transducer (100) and a plate to be cleaned (200), the ultrasonic transducer (100) and the plate to be cleaned A thin layer is arranged between the plates (200), which is characterized in that it includes the following steps: the ultrasonic transducer (100) generates vibration and radiates to the gas-liquid mixture in the thin layer, so that the gas-liquid interface in the thin layer generates Scour jets to form tangential scour cleaning on the surface of the plate (200) to be cleaned. The object of the present invention is to clean the plate to be cleaned by fluctuating the gas-liquid surface instead of using cavitation effect or high-speed vibration and shearing effect.

Description

Ultrasonic cleaning method and device technical field The present invention relates to the field of ultrasonic cleaning, in particular to a kind of ultrasonic cleaning method and device. Background technique Existing ultrasonic cleaning technology is generally through the cavitation effect, by means of the shock wave and micro-ejection generated when the cavitation collapses. The flow cleans the surface dirt. There are also cleaning methods that only use the vibration and shear effects of ultrasonic waves in liquids. When cleaning high-quality surfaces, weaker ultrasonic waves are often used to avoid cavitation. dirt, and use higher frequencies (eg, on the order of megahertz). However, this megasonic cleaning technology is very complicated in process. Equipment is expensive, making cleaning expensive. Therefore, it is necessary to develop an alternative low-cost solution to Effective and efficient cleaning of surfaces. SUMMARY OF THE INVENTION The object of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/12
CPCB08B3/12B08B2203/0288
Inventor 白立春高艳东陶志勇吴鹏飞白立新林伟军李超徐德龙
Owner LIAONING TECHNICAL UNIVERSITY
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