Ultrasonic cleaning method and device

An ultrasonic and ultrasonic technology, used in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems of expensive equipment, complicated processes, and high cleaning costs

Active Publication Date: 2017-03-22
LIAONING TECHNICAL UNIVERSITY +1
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  • Abstract
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Problems solved by technology

However, this megasonic cleaning technology is very complicated in proc...

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  • Ultrasonic cleaning method and device
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  • Ultrasonic cleaning method and device

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Embodiment Construction

[0026] The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.

[0027] figure 1 A flowchart of an ultrasonic cleaning method is provided for an embodiment of the present invention. like figure 1 As shown, the specific steps of the ultrasonic cleaning method include:

[0028] Applied to an ultrasonic cleaning device mainly composed of an ultrasonic transducer 100 and a plate to be cleaned 200, a thin layer is arranged between the ultrasonic transducer 100 and the plate to be cleaned 200, and it is characterized in that it includes the following steps:

[0029] Vibration is generated by the ultrasonic transducer 100 and radiates to the gas-liquid mixture in the thin layer, so that the thin layer forms a tangential scour on the surface of the plate to be cleaned.

[0030] Specifically: Vibration is generated by the ultrasonic transducer 100 and radiated to the gas-liquid mixture in...

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Abstract

The invention relates to an ultrasonic cleaning method and device. The ultrasonic cleaning method is applied to an ultrasonic cleaning device mainly composed of an ultrasonic transducer (100) and a board (200) to be cleaned. A thin layer is arranged between the ultrasonic transducer (100) and a board (200). The ultrasonic cleaning method is characterized by comprising the following steps that the ultrasonic transducer (100) generates vibration, the vibration is radiated to a gas-liquid mixture in the thin layer, so that a gas-liquid interface in the thin layer generates scouring jet flow, and therefore tangential scouring cleaning on the surface of the board (200) to be cleaned is formed. The ultrasonic cleaning method and device aim to achieve that the board to be cleaned is cleaned through fluctuation of the gas-liquid interface instead of through a cavitation effect or high-speed vibration or a shear effect.

Description

technical field [0001] The invention relates to the field of ultrasonic cleaning, in particular to an ultrasonic cleaning method and device. Background technique [0002] The existing ultrasonic cleaning technology generally uses the cavitation effect to clean the surface dirt with the help of shock waves and micro jets generated when the cavitation collapses. There are also cleaning methods that only use the vibration and shear effects generated by ultrasonic waves in the liquid. In order to avoid cavitation, weaker ultrasonic waves are often used for cleaning high-gloss surfaces, and higher frequencies (such as megahertz levels) are used to clean away tiny dirt. However, this megasonic cleaning technology is very complicated in process, and the equipment is expensive, which makes the cleaning cost very high. Therefore, it is necessary to develop an alternative low-cost solution for effective and efficient cleaning of high-gloss surfaces. Contents of the invention [0...

Claims

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Application Information

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IPC IPC(8): B08B3/12
CPCB08B3/12B08B2203/0288
Inventor 白立春高艳东陶志勇吴鹏飞白立新林伟军李超徐德龙
Owner LIAONING TECHNICAL UNIVERSITY
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