Tunnel furnace and input method of protective gas in tunnel furnace

An input method, technology of tunnel furnace, applied in the direction of furnace, furnace type, lighting and heating equipment, etc., can solve problems such as consumption of protective gas

Inactive Publication Date: 2017-02-01
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The main purpose of the present invention is to provide a tunnel furnace and a method for inputting shielding gas in the tunnel furnace to solve the problem in the prior art that a lot of shielding gas needs to be consumed when replacing the shielding gas in the tunnel furnace

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  • Tunnel furnace and input method of protective gas in tunnel furnace
  • Tunnel furnace and input method of protective gas in tunnel furnace
  • Tunnel furnace and input method of protective gas in tunnel furnace

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Embodiment Construction

[0027] It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and examples.

[0028] In order to enable those skilled in the art to better understand the solutions of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only It is an embodiment of a part of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.

[0029] It should be noted that the terms "first...

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Abstract

The invention provides a tunnel furnace and an input method of a protective gas in the tunnel furnace. The tunnel furnace comprises a heating section and an inert gas protection device arranged on the heating section, wherein the inert gas protection device comprises an air inlet and an air outlet; the air inlet and the air outlet are formed in the heating section at intervals; the air inlet is used for introducing an inert gas; the air outlet is used for discharging air; the air outlet area of the air outlet can be adjusted; and when the oxygen content in the heating section is larger than a first preset value, the air outlet area of the air outlet is decreased. According to the tunnel furnace, when the oxygen content in the heating section is larger than the first preset value, the air outlet area of the air outlet of the inert gas protection device is decreased, the air replacement rate of the tunnel furnace is decreased, and the air tightness in the furnace is improved; and when the inert gas is introduced into the air inlet of the inert gas protection device, the oxygen content in the furnace is quite liable to decrease, so that the oxygen content in the heating section can be made lower than the first preset value only through introducing a small amount of the inert gas.

Description

technical field [0001] The invention relates to the technical field of baking process equipment, in particular to a tunnel furnace and a method for inputting protective gas in the tunnel furnace. Background technique [0002] In the 3DCell manufacturing process, the substrate coated with the lens structure needs to be baked at high temperature to fully volatilize the uncured substance. In order to avoid yellowing during baking, nitrogen is added to the furnace to protect the substrate. The nitrogen tunnel furnace is a new type of baking tunnel furnace specially designed to meet its process requirements. [0003] Among the main process parameters of the nitrogen tunnel furnace, there are specific requirements for the amount of oxygen, and there are also requirements for the air replacement rate. The so-called replacement rate refers to the percentage of gas discharged per minute relative to the inner cavity capacity. For example, if the inner cavity volume is 1000L and the r...

Claims

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Application Information

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IPC IPC(8): F27B9/04F27B9/30F27B9/40
CPCF27B9/047F27B9/30F27B9/40
Inventor 殷剑东唐浩李存亮
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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