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Sputtering target, sputtering device and prosthesis coating method

A sputtering target and sputtering technology, which is applied in the field of medical treatment, can solve the problems of low service life of prosthetic structures, improve safety and reliability, prevent damage to the human body, and improve life expectancy

Pending Publication Date: 2016-12-07
BEIJING AKEC MEDICAL
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main purpose of the present invention is to provide a kind of sputtering target, sputtering apparatus and prosthesis coating method, to solve the problem that the life-span of prosthesis structure in the prior art is lower

Method used

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  • Sputtering target, sputtering device and prosthesis coating method
  • Sputtering target, sputtering device and prosthesis coating method
  • Sputtering target, sputtering device and prosthesis coating method

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Embodiment Construction

[0023] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and examples.

[0024] The present invention provides a sputtering target, please refer to Figure 1 to Figure 3 , the sputtering target includes: a sputtering plate 10, a sputtering hole 11 is arranged on the sputtering plate 10; a shielding plate 20, the shielding plate 20 is shielded at the sputtering hole 11, and the shielding plate 20 is movably arranged to adjust the shielding plate The flow area of ​​the sputter hole 11 blocked by 20.

[0025] The sputtering target in the present invention comprises a sputtering plate 10 and a shielding plate 20 for shielding the sputtering hole 11 on the sputtering plate 10, since the shielding plate 20 is movably arranged on the sputtering plate 10, like this, it can...

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Abstract

The invention provides a sputtering target, a sputtering device and a prosthesis coating method. The sputtering target comprises a sputtering plate and a baffle, wherein sputtering holes are formed in the sputtering plate, and the baffle shields the sputtering holes and is movably arranged so as to adjust the circulation area of the sputtering holes shielded by the baffle. The sputtering target solves the problem that a prosthesis structure in the prior art is short in service life.

Description

technical field [0001] The invention relates to the field of medical treatment, in particular to a sputtering target, a sputtering instrument and a prosthesis coating method. Background technique [0002] Ti 6 Al 4 V alloy is widely used in the medical field because of its superior properties such as better biocompatibility, corrosion resistance, high strength, and elastic modulus similar to that of cortical bone. However, long-term use in the human environment will release Al and V ions. Al and V ions are toxic, carcinogenic and teratogenic to the human body. Moreover, Al makes the surface potential of Ti positively shift, which will lead to the deposition of fibrin and form thrombus in the environment in contact with thrombus fluid, which reduces the safety and reliability of material use. [0003] At present, the material used in some prosthetic structures is Ti 6 Al 4 V alloy, because the precipitation of Al and V ions will lead to aseptic loosening of the prosthes...

Claims

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Application Information

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IPC IPC(8): A61L27/30A61L27/50C23C14/35C23C14/16C23C14/58H01L21/203
CPCA61L27/306A61L27/50H01L21/02631C23C14/165C23C14/3407C23C14/352C23C14/5806A61L2420/02
Inventor 孟德松
Owner BEIJING AKEC MEDICAL
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