A cleaning device and a cleaning method using the same

Abstract

The invention discloses a cleaning device and a cleaning method using the device. The cleaning device comprises: a first cleaning tank body located in a first space in a protection cavity, and a second cleaning tank body located in a second space in the protection cavity; The first cleaning tank and the second cleaning tank are isolated by an isolation device; the isolation device includes a spacer and an isolation container, wherein: one end of the spacer is placed in the isolation container, and the other end of the spacer is fixed on the top of the protection chamber. When there is an isolating liquid in the spacer, the spacer isolates the first space from the second space. When cleaning: after the first cleaning tank is cleaned, take it out and place it in the isolation container, and transfer the items to be cleaned from the side of the isolation container in the first space to the side in the second space; transfer the items to be cleaned from the Take it out from the isolation container and place it in the second cleaning tank. The invention solves the problem of cross-contamination between cleaning liquids and the safety problem in the cleaning process; it can clean continuously and improve the cleaning efficiency.

Description

technical field [0001] The invention relates to the technical field of cleaning electronic components, in particular to a cleaning device and a cleaning method using the device. Background technique [0002] With the development of manufacturing technology, especially the development of solar cells, semiconductors, optical devices, precision instruments, etc., the requirements for the cleanliness of the surface of the article are getting higher and higher, which requires ensuring the cleanliness of the cleaning solution during the cleaning process, and Some cleaning solutions are easy to volatilize, and the volatile vapors of adjacent different types of cleaning solutions will react with each other, resulting in contamination of the cleaning solution. Currently in the semiconductor industry, RCA cleaning, which was pioneered by Kern and Puotinen in N.J.Princeton's RCA laboratory in 1965 and named after it, is commonly used in the semiconductor industry. Ammonia, hydrogen per...

AI Technical Summary

Problems solved by technology

[0007] The disadvantage of the prior art is that the single-tank cleaning device cannot perform continuous cleaning, which greatly reduces the cleaning efficiency, and the open cleaning device cannot avoid the volatile gas and steam of the cleaning solution, and the solutions will react to form new ones after they are mixed with each other. Some chemical substances, some even produce toxic, flammable, and explosive substances, which bring hidden dangers to safety production. At the same time, cross-contamination of solutions will reduce the cleaning effect. After the solution is contaminated, only the liquid can be changed, which increases the cleaning cost.

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