Compact type high-power hollow cathode discharge device

Abstract

The invention discloses a compact type high-power hollow cathode discharge device which comprises a sealing tube, a hollow cathode tube, a cathode plate, a first insulation plate, an auxiliary anode plate, an insulation tube, permanent magnets, an annular anode plate, a third water cooling channel and a control power source. The hollow cathode tube is mounted on the cathode plate. The sealing tube is connected with the cathode plate, and the hollow cathode tube is sleeved with the sealing tube. A gas input opening is further formed in the top of the sealing tube. The first insulation plate is used for achieving insulation of the cathode plate and the auxiliary anode plate. The insulation tube is arranged on the first insulation plate. The permanent magnets and the third water cooling channel are both arranged outside the auxiliary anode plate. The distance between the annular anode plate and the bottom of the auxiliary anode plate ranges from 30 cm to 50 cm. The control power source is connected with the cathode plate, the auxiliary anode plate and the annular anode plate. The compact type high-power hollow cathode discharge device is simple in structure, high in power, wide in parameter section of plasma and capable of being applied to wider-range scientific research and industrial application.

Description

technical field [0001] The invention relates to the technical field of low-temperature plasma, in particular to a compact high-power hollow cathode discharge device. Background technique [0002] At present, in the field of industrial and scientific research applications, low-temperature plasma technology has played a huge role and has a good application prospect in surface treatment of materials, metallurgy, and auxiliary combustion. In the actual application process, it is necessary to select a suitable plasma source according to the process parameters and the application environment. However, in the existing plasma applications, due to the limitation of the specific plasma generation principle, the size and structural characteristics of the treated objects, the devices are generally complicated and can only process a single sample. Therefore, it is difficult for such a plasma device to spread to other areas. [0003] The publication number is CN102376521A, and the techn...

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Problems solved by technology

However, it requires a lot of power and the structure of the device is relatively complicated.

[0004] In addition, for many hollow cathode discharge devices, due to the influence of thermal effects, the plasma discharge is generally in the glow discharge interval, so it is difficult to increase the plasma discharge power

In addition, such as commercial inductively coupled plasma sources, microwave plasma discharge sources, etc., due to the indirect way of power input, the energy utilization efficiency is generally not high, and the plasma ionization rate is relatively low, so it is difficult to increase the plasma ionization rate. body power

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