Method for searching characteristic graphs of layouts in mask design

Abstract

The invention discloses a method for searching characteristic graphs of layouts in mask design. The method comprises the following steps: 1, coding data graphs of a layout, and the coding comprises the following sub-steps: 11, dividing the data graphs into a plurality of area blocks on the layout, 12, obtaining one code of each area block according to the condition whether graphs exist in the area blocks of the data graphs, and 13, synthesizing the codes of the area blocks of the data graphs so as to form code values of the data graphs; and 2, searching characteristic graphs in the layout, and the searching comprises the following sub-steps: 21, obtaining code values of to-be-searched characteristic graphs, 22, comparing the code values of the characteristic graphs with the code values of the data graphs in the layout, and 23, determining whether characteristic graphs exist in the layout according to the code value comparison result. According to the method disclosed in the invention, automatic search of characteristic graphs in layouts can be realized, so that the omission of characteristic graphs in the layouts can be avoided, the workload of manual check can be decreased, and the working efficiency can be improved.

Description

technical field [0001] The invention relates to a semiconductor integrated circuit manufacturing process method, in particular to a method for searching characteristic patterns of layouts in mask plate design. Background technique [0002] Scribe groove structure design is the design carried out after the product design data input check in the mask design business, and before EB processing and mask production, where EB processing generates data for mask production for layer calculation. It is mainly based on the size specification of the mask plate and the layout design of the cutting line according to the size of the chip. At the same time, various lithography alignment and testing graphics required by the product engineering are placed on the cutting line, and finally the mask plate is generated. final layout data. [0003] As the number of processes involved in the mask design business continues to increase, checking that the alignment test marks in the scribe line data ...

AI Technical Summary

Problems solved by technology

However, this method only detects some cases of missed discharges, when such Figure 1A If the placement shown is incorrect, no judgment can be made because Figure 1A Alignment mark 103 is indeed placed in , through the name comparison of alignment mark 103, it can be found that alignment mark 103 is placed in the layout; but due to Figure 1A The alignment mark 103 in the device overlaps with other device units. When this overlap occurs, the alignment mark 103 will no longer work, which is the same as the effect of leakage, but the existing method cannot automatically detect this. In this case, manual inspection is required, which will obviously increase the workload, reduce work efficiency, and also bring manual errors

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