Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cutoff filter

A technology for cutting off light and infrared light, applied in the field of filters, can solve the problem of not being able to cut off both infrared light and ultraviolet light, film thickness, etc., to improve adhesion and crystallization effect, good light transmittance, reduce absorption effect

Inactive Publication Date: 2016-07-06
SHENZHEN LEAGUER OPTRONICS
View PDF8 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the shortcomings of the above-mentioned prior art, and provide a cut-off filter, which aims to solve the problem that the film layer is thick and cannot cut off infrared light and ultraviolet light at the same time.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cutoff filter
  • Cutoff filter
  • Cutoff filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0026] In describing the present invention, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", The orientation or positional relationship indicated by "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than Nothing indicating or implying that a referenced device or element...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a cutoff filter which comprises a blue glass substrate, an infrared cutoff membrane stack and an ultraviolet cutoff membrane stack which are arranged at two sides of the blue glass substrate. The infrared cutoff membrane stack is formed through stacking a first high-refractivity film layer with a first refractivity and a second low-refractivity film layer with a second refractivity. The ultraviolet cutoff membrane stack is formed through stacking a third high-refractivity film layer with a third refractivity and a fourth low-refractivity film layer with a fourth refractivity, wherein the first refractivity is larger than the second refractivity; the third refractivity is larger than the fourth refractivity; and the infrared cutoff membrane stack and the ultraviolet cutoff membrane stack are deposited on the blue glass substrate in a megnetron sputtering manner. According to the cutoff filter, infrared light is cut off through the infrared cutoff membrane stack and the blue glass substrate and the ultraviolet light is cut off through the ultraviolet cutoff membrane stack; and the infrared cutoff membrane stack and the ultraviolet cutoff membrane are deposited on the blue glass substrate in a megnetron sputtering manner, thereby reducing thickness of the cutoff filter.

Description

technical field [0001] The invention belongs to the field of optical filters, in particular to a cut-off filter. Background technique [0002] In recent years, with the rapid growth of smartphones and tablets. Especially driven by the iPhone, the global demand for lenses has exploded, leading to a substantial growth in the shipment of camera phone lenses and NB modules. The camera function of mobile phones has become a must-have function, and the pixels of high-resolution smartphones and high-end digital cameras are gradually increasing. The higher the pixels, the higher the requirements for the technology of the camera system. Apple introduced the "blue glass filter" from the iPhone 4 / 4S to greatly improve the quality of photos. Since then, Xiaomi 2, Meizu MX2 and other high-end mobile phones equipped with 8 million or more pixels have become popular with back-illuminated cameras embedded with blue glass filters. At present, the use of blue glass filter has become the mai...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20
CPCG02B5/208
Inventor 黄亮蒋蔚陈凯许东东黄受林黄海东
Owner SHENZHEN LEAGUER OPTRONICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com