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Preparation method of large-size cu(100) single crystal copper foil

A copper foil and single crystal technology is applied in the field of preparation of large-size Cu single crystal copper foil, which can solve problems such as reducing grain boundary density, and achieve the effects of reducing preparation cost, low cost and simple method.

Active Publication Date: 2017-12-29
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These surface treatment methods can effectively eliminate the point defect density on the copper foil surface, but cannot significantly reduce the grain boundary density

Method used

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  • Preparation method of large-size cu(100) single crystal copper foil
  • Preparation method of large-size cu(100) single crystal copper foil
  • Preparation method of large-size cu(100) single crystal copper foil

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Embodiment one: a kind of method for annealing doped polycrystalline copper to prepare single crystal Cu (100), comprises the following steps:

[0018] (1), place the polycrystalline copper foil doped with the metal element flatly on the high temperature resistant substrate, put it into the chemical vapor deposition equipment, pass inert gas and H 2 Gas, the inert gas flow rate is 300~500sccm, H 2 Flow rate is 20~50sccm, then starts to heat up, and described inert gas is N 2 or Ar;

[0019] (2) When the temperature rises to 800~1100℃, H 2 Gas, H 2 The flow rate is 2-500 sccm, the annealing process is carried out, and the Cu(100) single crystal copper foil is obtained after the annealing is completed.

[0020] Carry out XRD characterization to the copper foil after above-mentioned annealing, the result is as follows figure 1 as shown in b. Depend on figure 1 b It can be seen that the front and back of the annealed copper foil have only one direction, that is, the ...

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Abstract

The invention provides a preparation method of a large-size Cu(100) single-crystal copper foil. The method comprises the step that a polycrystalline copper foil doped with metallic elements serves as the raw material, and single-crystal Cu(100) with a super-large size is prepared through a special annealing technology. The preparation method of the large-size Cu(100) single-crystal copper foil solves the problem that the single-crystal Cu(100) is high in price, and preparation of the Cu(100) single-crystal copper foil is achieved through the very simple method.

Description

technical field [0001] The invention relates to a preparation method of large-size Cu(100) single crystal copper foil. Background technique [0002] In 2009, Rouff et al. first discovered that high-quality single-layer graphene can be effectively obtained by using chemical vapor deposition (CVD) with copper foil as the substrate and catalyst. This method is simple, easy to operate, and low in cost. By adjusting the experimental conditions, large-sized single-crystal graphene can be obtained, and the obtained graphene can be easily transferred to other substrates. Based on these advantages, the use of CVD to grow graphene on copper foil has attracted much attention. [0003] However, there is a big problem with graphene prepared by CVD, that is, most of the synthesized graphene is polycrystalline. The existence of grain boundaries will greatly reduce the mobility of graphene, hindering its application in the field of electronic devices. At present, reducing the grain bound...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B29/52C30B1/02
CPCC30B1/02C30B29/52
Inventor 张智宏徐小志刘开辉
Owner PEKING UNIV
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