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Abrasive silicon dioxide for low-abrasion high-cleaning-power toothpaste and preparation method thereof

A silicon dioxide, low-wear technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of low wear and high cleaning, achieve stable process, simple operation, and be conducive to popularization and application

Active Publication Date: 2016-06-29
GUANGZHOU FEIXUE MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The RDA value of the dentifrice preparation of this material is 80~120, the PCR value is 80~120, and the ratio of PCR to RDA is 0.7~1.0, but it still cannot achieve the purpose of low wear and high cleaning

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Example 1. Friction-type silica for low-abrasion and high-clean toothpaste of the present invention and its preparation

[0027] Preparation method: S1, SiO 2 :Na 2 The solid sodium silicate with O=3.3~3.45 is pressurized and heated to liquefy, then add water to prepare sodium silicate solution with a concentration of 0.6M, a sodium silicate solution with a concentration of 1M and a sodium silicate solution with a concentration of 1.8M, and set aside;

[0028] S2. Mix dilute sulfuric acid with a concentration of 1M and silica powder with a particle size of 8 μm, add the sodium silicate solution with a concentration of 0.6M under high-speed stirring at 34HZ until the pH value is 2, and stir for 10 minutes to obtain an acidic Silica sol, spare;

[0029] S3, inject described concentration into reaction tank and be the sodium silicate solution 10m of 1M 3 , adding 10m of sodium chloride solution with a mass concentration of 5% 3 , stirred for 10min, then heated to 75°C,...

Embodiment 2

[0032] Example 2, Friction-type silica for low-abrasion and high-clean toothpaste of the present invention and its preparation

[0033] Preparation method: S1, SiO 2 :Na 2The solid sodium silicate with O=3.3~3.45 is pressurized and heated to liquefy, and then add water to prepare sodium silicate solution with a concentration of 0.8M, a sodium silicate solution with a concentration of 1.3M and a sodium silicate solution with a concentration of 2.2M. ;

[0034] S2. Mix dilute sulfuric acid with a concentration of 3M and silica powder with a particle size of 15 μm, add the sodium silicate solution with a concentration of 0.8M under high-speed stirring at 38HZ until the pH value is 3, and stir for 10 minutes to obtain acidity Silica sol, spare;

[0035] S3, inject described concentration into reaction tank and be the sodium silicate solution 12m of 1.3M 3 , adding a mass concentration of 8% sodium chloride solution 12m 3 , stirred for 10min, then heated to 90°C, started stirr...

Embodiment 3

[0038] Example 3, Friction-type silica for low-abrasion and high-clean toothpaste of the present invention and its preparation

[0039] Preparation method: S1, SiO 2 :Na 2 The solid sodium silicate with O=3.3~3.45 is pressurized and heated to liquefy, and then add water to prepare sodium silicate solution with a concentration of 0.7M, a sodium silicate solution with a concentration of 1.2M and a sodium silicate solution with a concentration of 2.0M. ;

[0040] S2. Mix dilute sulfuric acid with a concentration of 2M and silica powder with a particle size of 12 μm, add the sodium silicate solution with a concentration of 0.7M under high-speed stirring at 35HZ until the pH value is 2, and stir for 10 minutes to obtain acidity Silica sol, spare;

[0041] S3, inject described concentration into reaction tank and be the sodium silicate solution 12m of 1.2M 3 , adding a mass concentration of 6% sodium chloride solution 10m 3 , stirred for 10min, then heated to 80°C, started to s...

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Abstract

The invention belongs to the technical field of silicon dioxide for toothpaste and relates to abrasive silicon dioxide for low-abrasion high-cleaning-power toothpaste and a preparation method thereof. The preparation method comprises: S1, liquefying solid sodium silicate; S2, mixing dilute sulfuric acid and silicon dioxide powder, adding sodium silicate solution under stirring until pH is 2-3, and stirring to obtain acidic silicon sol; S3, injecting the sodium silicate solution and sodium chloride solution, stirring, heating, adding sulfuric acid until pH is 10-11, and adding the acidic silicon sol; S4, adding both the sodium silicate solution and sulfuric acid, keeping pH to be 9.0-9.5, after the sodium silicate solution is completely added, continuing to add sulfuric acid until pH is 2-3, ageing, press-filtering, washing, and drying and crushing to obtain the abrasive silicon dioxide for low-abrasion high-cleaning-power toothpaste; RDA value of the abrasive silicon dioxide is 120-140, PCR value is 120-140, PCR / RDA is 0.86-1, and the abrasive silicon dioxide has low abrasion and high cleaning powder.

Description

technical field [0001] The invention belongs to the technical field of silicon dioxide for toothpaste, and in particular relates to a frictional silicon dioxide for toothpaste with low wear and high cleaning and a preparation method thereof. Background technique [0002] Abrasives account for a large proportion in the toothpaste formula. Abrasives can remove dirt on the surface of teeth. Good abrasives not only have the effect of cleaning teeth and removing plaque, but also cannot cause excessive wear and tear on teeth. Silica is a spherical porous structure without sharp edges and corners that will not wear teeth too much. It has stable physical and chemical properties, strong cleaning ability, good compatibility with toothpaste systems, and can be used for the preparation of transparent toothpaste. Has been widely used in the toothpaste industry. [0003] Film cleaning rate (PCR) and relative dentin loss (RDA) are common industry standards for measuring the effectiveness ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/18
CPCC01B33/18C01P2004/61C01P2006/19
Inventor 任振雪庹文喜林英光赵国法李丽峰
Owner GUANGZHOU FEIXUE MATERIAL TECH
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