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Preparation method of aluminum film water-based light-resistant stripping liquid in thin film liquid crystal display

A liquid crystal display and stripping liquid technology, applied in the direction of photosensitive material processing, etc., can solve problems such as large environmental pollution, human and environmental damage, and human health damage, and achieve the effects of avoiding damage, reducing temperature, and improving photoresist stripping performance

Inactive Publication Date: 2016-05-11
WUXI JIJIN ENVIRONMENTAL PROTECTION TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 3) Ethanolamine (MEA) and dimethyl sulfoxide (DMSO) have great environmental pollution and great harm to human health
[0006] Therefore be necessary to provide a kind of improved aluminum film water system photoresist stripping liquid and preparation method thereof, improve the photoresist stripping performance in the thin film liquid crystal display manufacturing process, reduce process condition temperature, and avoid the positive glue stripping liquid that uses originally to cause Damage to humans and the environment

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1, take by weighing the potassium hydroxide solution of 10kg, then slowly join in the reactor that suitably deionized water is filled with by automatic feeding system, and fully stir, and stirring temperature is 40 degree, and stirring air pressure is 1.2Mpa, Stirring time is 10 minutes, and the speed of stirring is 45 rpm;

[0019] Then weigh 12kg of triethanolamine solution, 1.2kg of o-fluorobenzoic acid, 5kg of vinyl n-butyl ether, 2.5kg of isopropyl n-sulfide, 0.2kg of pure sulfuric acid and appropriate deionized water, and fully stir , the stirring temperature is 30 degrees, the stirring air pressure is 2.2Mpa, the stirring time is 15 minutes, and the stirring speed is 55 rpm;

[0020] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture, and obtain an aluminum film water-based pho...

Embodiment 2

[0022] Embodiment 2, take by weighing the potassium hydroxide solution of 13kg, then slowly join in the reactor that suitably deionized water is filled with by automatic feeding system, and fully stir, stirring temperature is 50 degree, and stirring air pressure is 1.7Mpa, The stirring time was 12 minutes, and the stirring speed was 45 rpm;

[0023] Then weigh 17kg of triethanolamine solution, 2.2kg of o-fluorobenzoic acid, 10kg of vinyl n-butyl ether, 4.5kg of isopropyl n-sulfide, 0.4kg of pure sulfuric acid and appropriate deionized water, and fully stir , the stirring temperature is 35 degrees, the stirring air pressure is 2.9Mpa, the stirring time is 20 minutes, and the stirring speed is 65 rpm;

[0024] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2.5 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain an aluminum film water-based pho...

Embodiment 3

[0026] Embodiment 3, take by weighing the potassium hydroxide solution of 16kg, then slowly join in the reactor that suitably deionized water is filled with by automatic feeding system, and fully stir, stirring temperature is 60 degree, and stirring air pressure is 2.3Mpa, The stirring time was 15 minutes, and the stirring speed was 45 rpm;

[0027] Then take by weighing 20kg of triethanolamine solution, 2.8kg of o-fluorobenzoic acid, 15kg of vinyl n-butyl ether, 6.9kg of isopropyl n-sulfide, 0.6kg of pure sulfuric acid and appropriate deionized water, and fully stir , the stirring temperature is 40 degrees, the stirring air pressure is 3.3Mpa, the stirring time is 25 minutes, and the stirring speed is 75 rpm;

[0028] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 3 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain an aluminum film water-...

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Abstract

The invention discloses a preparation method of aluminum film water-based light-resistant stripping liquid in a manufacturing process of liquid crystal panels. According to the preparation method, the stripping liquid comprises the following compositions in percentage by weight: 10%-16% of a potassium hydroxide solution, 12%-20% of a triethanolamine solution, 1.2%-2.8% of o-fluorobenzoic acid, 5%-15% of n-butyl vinyl ether, 2.5%-6.9% of isopropyl dipropyl sulfide, 0.2%-0.6% of pure sulfuric acid and the balance of deionized water. According to the aluminum film water-based light-resistant stripping liquid, the water-based light-resistant stripping performance of liquid crystal panel products can be improved, the temperature of process conditions is decreased, and the damages caused by originally utilized positive photoresist stripping liquid to the human body and the environment are avoided.

Description

technical field [0001] The invention relates to a preparation method of an aluminum film water-based photoresist stripping solution in a thin film liquid crystal display. Background technique [0002] At present, the low-temperature water-based positive glue stripper is a transparent and volatile liquid, flammable, and its density (25°C) is about 1.0g / ml. The aluminum film water-based photoresist stripping solution is mainly used for the photoresist stripping of the dust produced by the thin-film liquid crystal display panel, and the operating temperature is about 80°C; Composed of ultrapure water, this product mainly has the following disadvantages: [0003] 1) It is easy to attack the metal layer protected by the photoresist when the photoresist is stripped with the low-temperature water-based positive resist stripping solution, resulting in a decrease in product yield; [0004] 2) The low-temperature water-based positive glue stripping solution requires a high process t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/42
Inventor 刘进军
Owner WUXI JIJIN ENVIRONMENTAL PROTECTION TECH CO LTD
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