Exposure measurement device and measurement platform thereof

A technology of exposure amount and measurement, which is applied in photolithographic exposure devices, microlithography exposure equipment, optics, etc., can solve the problems of glass 10 deformation, affecting the accuracy of CD and OL measurement data, etc., to ensure flatness , Strengthen the effect of flattening and improve accuracy

Active Publication Date: 2016-05-04
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The way that the industry generally adopts now is to adopt the way that 4-6 small platforms 12 are spliced ​​into a large platform, and there is no mechanism for connection and height relative adjustment between several small platforms 12, because the platforms 12 are spliced ​​and the

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  • Exposure measurement device and measurement platform thereof
  • Exposure measurement device and measurement platform thereof
  • Exposure measurement device and measurement platform thereof

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Embodiment Construction

[0023] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

[0024] In the figures, structurally similar units are denoted by the same reference numerals.

[0025] refer to figure 2 and image 3 , figure 2 is a schematic cross-sectional view of an exposure measurement device in a preferred embodiment of the present invention, image 3 It is a specific cross-sectional schematic diagram of the measurement platform of the preferred embodiment of the present invention.

[0026] Such as figure 2 As shown, the...

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Abstract

Preferred embodiments of the invention provide an exposure measurement device and a measurement platform thereof for measuring a critical dimension and coverage data of an exposure pattern on a measurement substrate. The exposure precision measurement device comprises an integral upper plate, an integral lower plate and a plurality of height adjustment mechanisms, wherein the integral upper plate is provided with an upper surface used for bearing the substrate; the integral lower plate is arranged under the integral upper plate; the height adjustment mechanisms are arranged between the integral upper plate and the integral lower plate and are supported between the integral upper plate and the integral lower plate; the height adjustment mechanisms are respectively subjected to fine tuning, so that the upper surface of the integral upper plate is flat.

Description

【Technical field】 [0001] The present invention relates to an exposure measurement device and its measurement platform, in particular to an exposure measurement device and its measurement platform for measuring the critical dimension and coverage data of an exposure pattern on a substrate. 【Background technique】 [0002] Photolithography is one of the methods used for patterning in semiconductor or liquid crystal display manufacturing technology, in which the pattern is transferred to the photoresist of the wafer or glass through a photomask, so the photomask is the key to the photolithography process. Common tools. In the process of photolithography, the critical dimension (Critical Dimension, also called "characteristic line width") of the wafer formed by photolithography patterning is a key process parameter in the photolithography process, which is mainly determined by the CD of the photomask. In the photolithography process, by setting the exposure energy in the exposur...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70441G03F7/70625
Inventor 祖伟
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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