Pressure-reducing drying device, substrate processing device and pressure-reducing drying method

A technology of decompression drying device and drying method, applied in optics, instruments, optomechanical equipment, etc., can solve problems such as bumping

Active Publication Date: 2016-03-09
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] When drying a treatment solution such as a photoresist applied ...

Method used

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  • Pressure-reducing drying device, substrate processing device and pressure-reducing drying method
  • Pressure-reducing drying device, substrate processing device and pressure-reducing drying method
  • Pressure-reducing drying device, substrate processing device and pressure-reducing drying method

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Experimental program
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no. 1 approach

[0083]

[0084] figure 1 It is a schematic diagram showing the configuration of the substrate processing apparatus 9 including the reduced-pressure drying apparatus 1 according to the first embodiment. The substrate processing apparatus 9 of this embodiment is an apparatus which performs application|coating of resist liquid, exposure, and the image development after exposure to the glass substrate G for liquid crystal display devices. Hereinafter, the glass substrate G for liquid crystal display devices is called a board|substrate G.

[0085] The substrate processing apparatus 9 includes a loading unit 90, a cleaning unit 91, a dehydration bake unit 92, a coating unit 93, a reduced-pressure drying device 1 as a reduced-pressure drying unit, and a pre-bake unit 94. , an exposure unit 95 , a development unit 96 , a rinse unit 97 , a postbake unit 98 , and a carry-out unit 99 serve as a plurality of processing units. The respective processing units of the substrate processing...

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Abstract

The invention provides a pressure-reducing drying device, a substrate processing device and a pressure-reducing drying method. The pressure-reducing drying device comprises a cavity accommodating a substrate, a pressure-reducing air-exhausting unit carrying out pressure-reducing air-exhausting on the inside of the cavity, a valve positioned between the cavity and the pressure-reducing air-exhausting unit which can adjust the flow of pressure-reducing and air-exhausting through an aperture of the valve, a learning unit obtaining pressure-reducing line data showing pressure changes due to pressure-reducing and air-exhausting in the cavity in accordance with the prescribed apertures of the valve, an input unit, in which target pressure values and target arriving time are input, and a control portion controlling the apertures of the valve and adjusting the apertures of the valve on the basis of pressure-reducing curve data, the input target pressure values and the target reaching time. The pressure-reducing can be carried out at a pressure-reducing speed closer to a required pressure-reducing speed.

Description

technical field [0001] The invention relates to a technique for decompression drying of a substrate adhered with a processing liquid, in particular to a decompression drying device, a substrate processing device and a decompression drying method. Background technique [0002] Conventionally, semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for plasma display panels (Plasma Display Panel, PDP), glass substrates for photomasks, and substrates for color filters In the manufacturing process of substrates for precision electronic devices such as substrates for discs, substrates for solar cells, and substrates for electronic paper, a vacuum drying device is used to dry the treatment liquid applied to the substrates. This reduced-pressure drying device has: a chamber for accommodating substrates; and an exhaust device for exhausting gas in the chamber. A conventional vacuum drying apparatus is described in Patent Document 1, for example. ...

Claims

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Application Information

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IPC IPC(8): H01L21/67G03F7/16G03F7/30
CPCG03F7/168G03F7/30H01L21/67023H01L21/67063
Inventor 富藤幸雄厨子卓哉
Owner DAINIPPON SCREEN MTG CO LTD
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