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Preparation method and application of potassium-doped mesoporous g-C3N4 photocatalytic material

A photocatalytic material, g-c3n4 technology, applied in the field of photocatalytic materials, can solve problems such as unfavorable environmental protection and large-scale preparation, low efficiency of organic pollutants, cumbersome synthesis process, etc., achieves excellent photocatalytic performance, is conducive to Environmental protection and large-scale application, the effect of simple preparation process

Active Publication Date: 2015-12-16
ANHUI UNIVERSITY OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, g-C 3 N 4 The specific surface area is small, and the photogenerated electrons and holes are easily recombined, so the efficiency of photocatalytic degradation of organic pollutants is not high.
In order to solve this problem, relevant researchers adopt the method of doping or compounding with other semiconductor materials, or the method of increasing the specific surface area, but the synthesis process is cumbersome, which is not conducive to environmental protection and large-scale preparation.

Method used

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  • Preparation method and application of potassium-doped mesoporous g-C3N4 photocatalytic material

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Experimental program
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preparation example Construction

[0020] 1. Preparation of SBA-15

[0021] According to reports by Zhao Dongyuan et al. in J.Am.Chem.Soc.Vol.120(1998)pp.6024-6036, the preparation method of SBA-15 is as follows: 4.0g of P123 is dissolved in 30g of water and 120g of hydrochloric acid (2M) , and the mixed solution was stirred at 35° C. for 2.5 h. Then add 8.50g of TEOS and continue to stir for 20h. Then the mixture was placed in an oven at 80 °C for 24 h. The mixture was filtered, washed with water, and dried at room temperature. Remove the surfactant in the channel by Soxhlet extractor extraction, use HCl (37wt% aqueous solution) / EtOH (V HCl / EtOH =1.5 / 98.5) as the extract.

[0022] 2. Potassium-doped mesoporous g-C 3 N 4 preparation of

Embodiment 1

[0023] Example 1: 20% potassium doped mesoporous g-C 3 N 4 preparation of

[0024] Weigh 5g of melamine and 1.66g of KI respectively, after fully grinding, weigh 3.0g of the mixture and put it into the bottom of the corundum crucible, and then evenly disperse 10.0g of SBA-15 on the mixture of melamine and KI. Cover the crucible and place it in a muffle furnace for calcination. Raise the temperature to 320°C for 4 hours at a rate of 10K / min. During this process, the mixture of melamine and KI will evaporate into the pores of the mesoporous material SBA-15, and then increase the temperature to 550°C at a rate of 2K / min. ℃ for 4 hours, then cooled down to room temperature naturally. The resulting product was removed with 5% hydrofluoric acid to remove the template, then fully washed with deionized water and ethanol until the pH value was 7, and dried at 60°C for 5 hours to obtain mesoporous K-doped C 3 N 4 .

[0025] XRD analysis shows ( figure 1 ), the prepared potassium ...

Embodiment 2

[0026] Example 2: 10% potassium doped mesoporous g-C 3 N 4 preparation of

[0027] Weigh 5g of melamine and 0.73g of KI respectively, after fully grinding, weigh 3.0g of the mixture and put it into the bottom of the corundum crucible, and then evenly disperse 10.0g of SBA-15 on the mixture of melamine and KI. Cover the crucible and place it in a muffle furnace for calcination. Raise the temperature to 320°C for 4 hours at a rate of 10K / min. During this process, the mixture of melamine and KI will evaporate into the pores of the mesoporous material SBA-15, and then increase the temperature to 550°C at a rate of 2K / min. ℃ for 4 hours, then cooled down to room temperature naturally. The resulting product was removed with 5% hydrofluoric acid to remove the template, then fully washed with deionized water and ethanol until the pH value was 7, and dried at 60°C for 5 hours to obtain mesoporous K-doped C 3 N 4 .

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Abstract

The invention discloses a preparation method of a potassium-doped mesoporous g-C3N4 photocatalytic material, and belongs to the technical field of photocatalytic materials. The method comprises the following steps: fully grinding melamine and KI to be tiled at the bottom of a crucible, uniformly dispersing SBA-15 on the mixture of melamine and KI, then capping the crucible, placing the crucible in a muffle furnace for calcination, and treating the product so as to obtain the potassium-doped mesoporous g-C3N4 photocatalytic material. The photocatalytic material is large in specific surface area, so that the reaction activity loci are added, after the potassium is doped, the compounding of photoelectrons and vacancies can be effectively inhibited, and relatively excellent photocatalytic performance can be expressed. The potassium-doped mesoporous g-C3N4 photocatalytic material can degrade organic dye wastewater, and can degrade 80% or above of target degradation products within 60 min, which shows the excellent photocatalytic activity.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic materials, in particular to a preparation method and application of a mesoporous photocatalytic material, in particular to a potassium-doped mesoporous g-C 3 N 4 Preparation method of photocatalyst and its application. Background technique [0002] At present, my country needs to discharge a large amount of industrial wastewater (such as petrochemical wastewater, printing and dyeing wastewater, and pharmaceutical wastewater) every year. ), azo organic pollutants, etc., their biodegradability is poor, and most of them have carcinogenic effects, endangering human health. At this time, it is difficult to remove them by the commonly used biological treatment technology, and even the introduction of these toxic substances may cause microbial poisoning, leading to the collapse of the biological treatment system. Therefore, it is imperative to treat industrial wastewater. [0003] g-C 3 N 4 I...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24C02F1/30
Inventor 池方丽周国栋宋标吕耀辉冉松林
Owner ANHUI UNIVERSITY OF TECHNOLOGY
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