Single-crystal and poly-crystal flocking equipment

Abstract

The invention discloses single-crystal and poly-crystal flocking equipment. The single-crystal and poly-crystal flocking equipment comprises an equipment body, stations arranged on the equipment body, a transmission device and a control system, wherein the stations are the acid soaking flocking station, the spray-washing station, the drying station, the alkali spraying flocking station, the spray-washing station, the alkali soaking treatment station, the spray-washing station, the acid treatment station, the spray-washing station and the drying station which are arranged in sequence, the transmission device is used for transmitting a silicon wafer to the stations in sequence, and the control system controls the working states of the stations; the alkali spraying flocking station is connected with a heating device, and the working state of the heating device is also controlled by the control system. The single-crystal and poly-crystal flocking equipment is stable, efficient and reliable in technological operation and capable of achieving seamless switching between poly-crystal acid flocking, poly-crystal alkali flocking, single-crystal acid flocking and single-crystal alkali flocking.

Description

technical field [0001] The invention relates to the technical field of silicon wafer texturing equipment, in particular to a single-polycrystalline texturing equipment. Background technique [0002] In recent years, with the continuous development of solar silicon cell technology, new processes have emerged one after another, and the conversion efficiency of silicon cells has been continuously refreshed. In the face of increasingly fierce competition in domestic and foreign markets, the elimination of traditional crafts has become an inevitable trend. [0003] In the prior art, traditional equipment is generally used for the preparation of the textured surface of monocrystalline silicon wafers, and it is not possible to realize the preparation of the textured surface of monocrystalline silicon wafers and the textured surface of polycrystalline silicon wafers on one piece of equipment. Provide replacement equipment or technology upgrades for the post-cleaning process. [00...

AI Technical Summary

Problems solved by technology

[0004] Also appeared in the prior art the equipment that is specially aimed at making texture of polysilicon wafer, for example, publication number is the patent of CN103441070A, and it is provided with transmission system, control system and polysilicon wafer processing station, and this polysilicon wafer processing station includes sequentially arranged Mixed acid texturing station, spray washing station, alkali texturing station, spray washing station, acid treatment station, spray washing station, according to the arrangement of each processing station, this equipment can only be used for The processing of polycrystalline silicon wafers cannot realize the texturing of monocrystalline silicon wafers or polycrystalline silicon wafers at the same time

Images