Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Thermosetting composition, cured film, color filter, liquid crystal display element, solid-state imaging element, and light-emitting diode emitter

A technology of thermosetting and composition, applied in the direction of optical filter, optical element, nonlinear optics, etc., can solve the problem of insufficient flatness and heat resistance of polyester amic acid composition, insufficient heat resistance, and light resistance Insufficient performance and other problems, to achieve the effect of improved display quality and reliability, and high practicability

Active Publication Date: 2018-01-30
JNC CORP
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polyamic acid composition containing silicon is a very excellent material in terms of flatness, but has the disadvantages of insufficient heat resistance and poor alkali resistance
The polyester amic acid composition of Patent Document 2 has disadvantages of insufficient flatness and heat resistance
The polyester amic acid composition of Patent Document 3 is a very excellent material in flatness, heat resistance, and chemical resistance, but has the following disadvantages: light resistance is not sufficient, and transparency decreases in the ultraviolet ozone treatment or ultraviolet exposure process
Therefore, as a protective film material, none of the above-mentioned materials sufficiently satisfies light resistance, flatness, heat resistance, chemical resistance, and other properties.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Thermosetting composition, cured film, color filter, liquid crystal display element, solid-state imaging element, and light-emitting diode emitter
  • Thermosetting composition, cured film, color filter, liquid crystal display element, solid-state imaging element, and light-emitting diode emitter
  • Thermosetting composition, cured film, color filter, liquid crystal display element, solid-state imaging element, and light-emitting diode emitter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0155] Next, the present invention will be specifically described by way of synthesis examples, reference examples, examples, and comparative examples, but the present invention is not limited by these examples. First, the polyester amic acid solution (synthesis example 1, synthesis example 2, synthesis example 3, and synthesis example 4) containing the reaction product of tetracarboxylic dianhydride, diamine, and a polyvalent hydroxyl compound was synthesize|combined as follows.

Synthetic example 1

[0156] [Synthesis Example 1] Synthesis of Polyester Amic Acid Solution (A1)

[0157] In a four-necked flask equipped with a stirrer, dehydrated and purified methyl 3-methoxypropionate (hereinafter abbreviated as "MMP"), 3,3', 4,4'-bis Phenyl ether tetracarboxylic dianhydride (hereinafter abbreviated as "ODPA"), 1,4-butanediol, and benzyl alcohol were stirred at 130° C. for 3 hours under a stream of dry nitrogen.

[0158]

[0159] Thereafter, the reaction solution was cooled to 25°C, and 3,3'-diaminodiphenylsulfone (hereinafter abbreviated as "DDS") and MMP were added in the following weight, and stirred at 20°C to 30°C for 2 hours , stirring at 115° C. for 1 hour.

[0160] DDS 29.33g

[0161] MMP 183.04g

[0162] [Z / Y=3.0, (Y+Z) / X=0.8]

[0163] The solution was cooled to room temperature to obtain a light yellow transparent 30% by weight solution (A1) of polyester amic acid. A part of the solution was sampled, and the weight average molecular weight was measured by GPC...

Synthetic example 2

[0164] [Synthesis Example 2] Synthesis of Polyester Amic Acid Solution (A2)

[0165] In a four-necked flask with a stirrer, dehydrated and purified propylene glycol monomethyl ether acetate (hereinafter abbreviated as "PGMEA"), 1,2,3,4-butane tetra Carboxylic acid dianhydride (hereinafter abbreviated as "BT-100"), SMA1000P (trade name; styrene-maleic anhydride copolymer, Chuanyuan Chemical Co., Ltd.), 1,4-butanediol, benzyl alcohol, in Stirring was performed at 125° C. for 3 hours under a stream of dry nitrogen.

[0166]

[0167] Then, the reaction liquid was cooled to 25 degreeC, DDS and PGMEA were thrown in by the following weight, and after stirring at 20 degreeC - 30 degreeC for 2 hours, it stirred at 125 degreeC for 2 hours.

[0168] DDS 9.60g

[0169] PGMEA 36.00g

[0170] [Z / Y=2.7, (Y+Z) / X=0.9]

[0171] The solution was cooled to room temperature to obtain a light yellow transparent 30% by weight solution (A2) of polyester amic acid. A part of the solution was s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to a composition containing: polyester amide acid, an epoxy group-containing polymer, an epoxy compound, and an epoxy hardener. The polyester amide acid is manufactured by reacting tetracarboxylic acid dianhydride, diamine, and a polyvalent hydroxyl compound as an essential raw material. The epoxy group-containing polymer is manufactured by reacting glycidyl (meth)acrylate and di-functional (meth)acrylate as an essential raw material. The thermosetting composition has an excellent coating property. A cured film formed by the thermosetting composition has excellent light resistance and an excellent flat property. The cured film has: excellent thermal resistance; excellent chemical resistance such as solvent resistance, acid resistance, and alkaline resistance; excellent water resistance; excellent adhesion for a lower substrate such as glass or the like; a transparent property; and scar resistance.

Description

technical field [0001] The present invention relates to an insulating material that can be used to form an insulating material in an electronic part, a passivation film in a semiconductor device, a buffer coating film, an interlayer insulating film, or a planarizing film, or an interlayer insulating film or a color film in a liquid crystal display element. A thermosetting composition such as a protective film for an optical filter, a transparent film using the thermosetting composition, and an electronic component including the film. Background technique [0002] In the manufacturing process of elements such as liquid crystal display elements, various chemical treatments such as organic solvents, acids, and alkali solutions may be performed, or when wiring electrodes are formed into films by sputtering, the surface may be locally heated to a high temperature . Therefore, a surface protective film may be provided in order to prevent deterioration, damage, and deterioration o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08L33/14C08L79/08C08L63/00C08G73/10G02B1/14G02B5/20G02F1/1335
Inventor 近藤学
Owner JNC CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com