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Chemical liquid feeding device and feeding method

A technology for supplying devices and chemical liquids, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc., can solve problems such as bulky system components, and achieve the effects of simple and compact structure, low energy consumption, and small footprint

Active Publication Date: 2015-10-14
SHENYANG KINGSEMI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the problem that the chemical liquid supply system is bloated due to more and more functional requirements, the purpose of the present invention is to provide a chemical liquid supply device and its supply method

Method used

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  • Chemical liquid feeding device and feeding method

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Embodiment Construction

[0018] The present invention will be described in further detail below with reference to the drawings.

[0019] Such as figure 1 As shown, the chemical liquid supply device of the present invention includes a raw material barrel 7, a first liquid supply barrel 9, a second liquid supply barrel 24, a recovery barrel 25, a vacuum generator 2, a high pressure pump 14, a chemical liquid pump 28, and a process chamber Body 29, filter, solenoid valve, chemical liquid valve, liquid level sensor and manual three-way valve, wherein the first liquid supply tank 9 is connected to the raw material tank 7 through the second pipeline 34, and is connected to the second pipeline 34 There is a first two-position two-way liquid medicine valve 4 that controls the opening and closing of the second pipeline 34 (the first two-position two-way liquid medicine valve 4 is in a normally closed state); the first liquid supply barrel 9 is respectively connected with a first The pipeline 33 and the third pip...

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Abstract

The invention belongs to the semiconductor industry wafer wet processing field and specifically relates to a chemical liquid feeding device and feeding method. First and second liquid feeding barrels are communicated with a gas source which is controlled to be on and off by an electromagnetic valve; a raw material barrel is communicated with the first liquid feeding barrel, and a pipeline is provided with a chemical liquid valve; one path of chemical liquid output from the first liquid feeding barrel is communicated with a soaking unit which is controlled to be on and off by the chemical liquid valve, another path of chemical liquid is communicated to a fan-shaped nozzle for spraying the chemical liquid to a wafer in a technology processing chamber, and a pipeline of the other path is provided with a high-pressure pump, and the pipeline is equipped with a chemical liquid valve; the technology processing chamber is communicated with a recycling bin; the chemical liquid in the technology processing chamber is recycled through the recycling bin, and is pumped into the second liquid feeding barrel through a chemical liquid pump; and the second liquid feeding barrel is communicated with the input end of the high-pressure pump through a pipeline, and the pipeline is equipped with a chemical liquid valve for controlling the pipeline to be on and off. The chemical liquid feeding device and feeding method realize uninterrupted supply of the chemical liquid without manual intervention; and the feeding device is simple and compact in structure and small in occupation area.

Description

Technical field [0001] The invention belongs to the field of wafer wet processing in the semiconductor industry, in particular to a chemical liquid supply device and a supply method thereof. Background technique [0002] At present, all wafer wet processing equipment in the semiconductor industry involves the supply of chemical liquids. As the automation and functions of the equipment become more and more complete, the corresponding chemical liquid supply systems have become larger and more complex. How to integrate and optimize the design of the liquid supply system has become an inevitable problem. Summary of the invention [0003] In order to solve the problem of bloated system components caused by the increasing functional requirements of the chemical liquid supply system, the purpose of the present invention is to provide a chemical liquid supply device and a supply method thereof. [0004] The purpose of the present invention is achieved through the following technical soluti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
Inventor 谷德君
Owner SHENYANG KINGSEMI CO LTD
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