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Closed circulating repetition-frequency optical pumping xenon fluoride laser system

A closed-loop, laser system technology, used in lasers, laser components, phonon exciters, etc., to avoid environmental pollution, fast flow exchange, and reduce gas waste.

Inactive Publication Date: 2015-07-15
NORTHWEST INST OF NUCLEAR TECH
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Problems solved by technology

[0005] The present invention proposes a gas-closed-cycle optically pumped xenon fluoride laser system operating at a repetition rate, which solves the problem that the existing XeF (C-A) laser can only operate at a low repetition rate, realizes high repetition rate operation, and greatly improves the output pulse rate Number

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  • Closed circulating repetition-frequency optical pumping xenon fluoride laser system
  • Closed circulating repetition-frequency optical pumping xenon fluoride laser system
  • Closed circulating repetition-frequency optical pumping xenon fluoride laser system

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Embodiment Construction

[0027] Such as Figure 1 to Figure 3 As shown, the repeated-frequency optically pumped xenon fluoride laser system of the present invention's closed cycle includes a discharge pump source, a resonant mirror 15, an output cavity mirror 16, a laser chamber 2 and a gas supply device; its basic working principle is that The discharge pump source described above generates ultraviolet light to dissociate XeF in the laser chamber 2 gas, and forms laser output under the resonance action of the resonant mirror 20 and the output cavity mirror 21.

[0028] Such as Figure 4 The laser chamber 2 shown is a square cavity, and its length, width and height correspond to the optical axis direction 30, the dissociation direction 31 and the airflow direction 32 respectively; the discharge pumping source includes a group of discharge substrates 1 and capacitors for power supply Group 14; the discharge substrate 1 is arranged on the two end faces of the laser chamber along the width direction; t...

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Abstract

The invention discloses a closed circulating repetition-frequency optical pumping xenon fluoride laser system which comprises a discharge pumping source, a resonant reflection mirror, an output cavity mirror, a laser cavity and a gas supply device, wherein the laser cavity is a square cavity, and the length, width and height directions of the laser cavity correspond to an optical axis direction, a dissociative direction and a gas flow direction respectively; the gas supply device is at least one closed circulating pipeline connected to two end surfaces in the height direction of the laser cavity; an axial-flow fan is arranged in the middle of the closed circulating pipeline and can be used for enabling XeF2 gas prefilled in the closed circulating pipeline to circularly flow in the pipeline. All pipelines of a laser are connected to form the closed circulating pipeline, and the axial-flow fan is utilized for driving laser mixed gas to circularly flow in the pipeline, so that high-power and multi-pulse repetition-frequency running of the XeF(C-A) laser is realized, the gas utilization rate is increased, gas waste is reduced, and caused environmental pollution is alleviated.

Description

technical field [0001] The invention relates to a gas closed-cycle repetitive frequency optically pumped xenon fluoride laser system, which belongs to an excimer gas laser, in particular to an optically pumped XeF (C-A) laser capable of repeated frequency operation. Background technique [0002] The output wavelength of the XeF(C-A) blue-green laser is 460nm~520nm, which is in the underwater and atmospheric transmission window. The single pulse energy reaches the ten-joule level, which is consistent with the requirements of the laser source for underwater laser communication, and also has a gain bandwidth. The advantages of very wide and tunable output wavelength, so the XeF(C-A) blue-green laser with high power and high repetition rate has a good application prospect in the field of laser underwater communication and underwater detection. From the process of XeF(C-A) blue-green laser output, XeF 2 Vapor molecules absorb photons in the vacuum ultraviolet band (130-180nm) ge...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/223H01S3/034H01S3/10
Inventor 于力黄超马连英易爱平刘晶儒沈炎龙朱峰安晓霞曾江涛钱航
Owner NORTHWEST INST OF NUCLEAR TECH
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