Overlay alignment mark and overlay measurement method
A technology for aligning marks and markings, applied in the field of semiconductors, can solve problems such as poor measurement accuracy, and achieve the effect of improving measurement accuracy
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[0027] The overlay alignment mark and overlay measurement method of the present invention will be described in more detail below in conjunction with schematic diagrams, wherein a preferred embodiment of the present invention is shown, and it should be understood that those skilled in the art can modify the present invention described herein while still The advantageous effects of the present invention are realized. Therefore, the following description should be understood as the broad knowledge of those skilled in the art, but not as a limitation of the present invention.
[0028] In the interest of clarity, not all features of an actual implementation are described. In the following description, well-known functions and constructions are not described in detail since they would obscure the invention with unnecessary detail. It should be appreciated that in the development of any actual embodiment, numerous implementation details must be worked out to achieve the developer's ...
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