A method to improve the spin-orbit coupling strength of co/pt thin film materials
A track coupling, thin film material technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of volatility, limit the application of low-power logic memory devices, etc., to increase the coupling strength, Low-cost, simple-to-prepare effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0018] figure 1 The preparation conditions of the samples in the sample are as follows: first, the TiNi shape memory alloy without pre-stretching and surface argon ion treatment is subjected to surface polishing: mechanical polishing and chemical polishing, and the surface roughness after polishing is 2 nanometers; then, using acetone and Clean the surface with alcohol to obtain a TiNi substrate with a clean surface, and the thickness of the substrate is 0.1 mm. Then, utilize magnetron sputtering method, on above-mentioned TiNi memory alloy substrate, deposit Co atom (thickness is ) and Pt atoms (thickness is ), the number of repetitions is 5, so that the deposition Multi-layer film, the background vacuum before sputtering deposition is 1×10 -5 Pa, the argon pressure during sputtering is 0.5Pa.
[0019] figure 2 The preparation conditions of the sample are as follows: firstly, pre-stretching, surface polishing and surface argon ion bombardment treatment are carried ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
surface roughness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com