Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Planar magnetron cathode

A magnetron cathode, planar technology, applied in the field of sputtering sources, can solve the problems of thermal expansion of planar magnetron cathodes

Inactive Publication Date: 2015-05-13
WUHU VACUUM TECH
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the problem of thermal expansion of the planar magnetron cathode in the prior art, and provide a planar magnetron cathode, which can prevent thermal expansion

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] Specific embodiments of the present invention will be described in detail below. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0019] In the present invention, unless stated to the contrary, the used orientation words such as "inner and outer" refer to inner and outer on the contour structure. "Far and near" refer to inside and outside relative to a certain part.

[0020] The invention provides a planar magnetron cathode. The planar magnetron cathode comprises: a nucleus, a magnet is embedded in the nucleus, and a channel is arranged on the magnet;

[0021] a copper plate sealing the channel;

[0022] The target material is formed by splicing a plurality of target blocks and fixed on the copper plate.

[0023] Through the above-mentioned embodiment, the planar magnetron cathode of the present invention dissipates heat to the tar...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a planar magnetron cathode. The planar magnetron cathode includes: a nuclear body, which is embedded with a magnet equipped with a channel; a copper plate, which seals the channel; and a target material, which is formed by splicing multiple target blocks and is fixedly connected to the copper plate. The planar magnetron cathode provided by the invention can prevent thermal expansion.

Description

technical field [0001] The invention relates to a sputtering source, in particular to a planar magnetron cathode. Background technique [0002] The temperature of the planar magnetron cathode in the prior art is very high when it is working. In a high temperature environment, the working efficiency of the planar magnetron cathode is reduced. In a high temperature environment, the planar magnetron cathode will thermally expand, which will reduce the planar magnetron To control the stability of the cathode, designing a low-temperature planar magnetron cathode has become an urgent problem to be solved. Contents of the invention [0003] The purpose of the present invention is to overcome the problem of thermal expansion of the planar magnetron cathode in the prior art, and provide a planar magnetron cathode, which can prevent thermal expansion. [0004] In order to achieve the above object, the present invention provides a planar magnetron cathode, the planar magnetron catho...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35
Inventor 薛辉任俊春金海涛
Owner WUHU VACUUM TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com