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Substrate Processing Device, Depositing Device, Substrate Processing Method And Depositing Method

A substrate processing device and substrate processing method technology, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as poor processing, and achieve the effect of suppressing bad

Active Publication Date: 2014-12-31
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

That is, in the process of aligning the mask with the substrate, etc. in the state where the substrate is placed on the susceptor, impurities fall from the mask, etc., onto the substrate and remain on the substrate, which may cause processing failure when the substrate is processed.
[0005] The present invention is made to solve various problems including the above-mentioned problems, and an object thereof is to provide a substrate processing apparatus that suppresses defects in substrate processing due to impurities when a mask is placed on a substrate, comprising the Device deposition apparatus, substrate processing method, and deposition method

Method used

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  • Substrate Processing Device, Depositing Device, Substrate Processing Method And Depositing Method
  • Substrate Processing Device, Depositing Device, Substrate Processing Method And Depositing Method
  • Substrate Processing Device, Depositing Device, Substrate Processing Method And Depositing Method

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Embodiment Construction

[0038] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but can be embodied in various forms that are different from each other. The following embodiments are provided for the purpose of making the disclosure of the present invention thorough and complete, and explaining the present invention The range fully conveys to those skilled in the art. In addition, components of the drawings may be exaggerated or reduced for convenience of description. For example, the size and thickness of each component appearing in the drawings are arbitrarily shown for convenience of explanation, and therefore the present invention is not necessarily limited to the illustrated ones.

[0039] In the following embodiments, the x-axis, y-axis and z-axis are not limited to the three axes on the Cartesian coordinate system, which can be interpreted...

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Abstract

In order to restrain the badness generated by impurities during the substrate processing when a mask is placed on a substrate to process the substrate, the present invention provides a substrate processing device which possesses a cavity having an inlet in which the substrate can be put, extends up and down, possesses a sucker internally and can support a plurality of mask pins of the mask, a depositing device possessing the substrate processing device, a substrate processing method and a depositing method.

Description

technical field [0001] The present invention relates to a substrate processing device, a deposition device equipped with the device, a substrate processing method, and a deposition method, and more specifically, relates to a method of placing a mask on a substrate to suppress impurities in substrate processing due to impurities. Defective substrate processing apparatus, deposition apparatus including the same, substrate processing method, and deposition method. Background technique [0002] Generally, for processing a substrate, a process of aligning the substrate and / or the mask by placing the substrate and the mask at a predetermined position relative to each other is performed. For this purpose, the substrate is processed after placing the substrate on a susceptor, aligning the substrate and the mask, and placing the mask on the substrate. Contents of the invention [0003] technical problem [0004] However, when the substrate is processed in the conventional substra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/02104H01L21/67011H01L21/6838H01L21/205H01L21/683
Inventor 金德镐许明洙张喆旼李勇锡
Owner SAMSUNG DISPLAY CO LTD
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