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Sub-aperture splicing measurement device and method for 45-degree plane mirror shape detection

A technology of splicing of sub-apertures and measuring devices, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of affecting the accuracy of the surface shape, the deformation of the plane mirror, and the inconvenience of the experiment, and achieve high interference contrast, simple operation, and high splicing accuracy Effect

Active Publication Date: 2017-07-14
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

The above sub-aperture splicing interferometry scheme can only detect a single plane shape. For the detection of a 45-degree flat mirror, the traditional method: ① Place the Fizeau interferometer at 45 degrees, but the operation is difficult and the experiment is inconvenient; ② The 45-degree The plane mirror is placed at 45 degrees, and the plane mirror may be deformed, which will affect the accuracy of the surface shape

Method used

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  • Sub-aperture splicing measurement device and method for 45-degree plane mirror shape detection
  • Sub-aperture splicing measurement device and method for 45-degree plane mirror shape detection
  • Sub-aperture splicing measurement device and method for 45-degree plane mirror shape detection

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Embodiment 1

[0027] A sub-aperture splicing measurement device for 45-degree plane mirror shape detection, such as figure 1 As shown, the light emitted by the Fizeau interferometer 1 passes through the first standard mirror 2 with a nominal reflectivity of 1%, is reflected by a 45-degree flat mirror with a nominal reflectivity of 4%, and then reaches the first standard mirror with a nominal reflectivity of 99%. Two standard mirrors 3, after being reflected by the second standard mirror 3 with a nominal reflectivity of 99%, the light returns along the original path; the first standard mirror 2 is clamped on the reference mirror adjustment frame 1 of the Fizeau interferometer placed horizontally -1; the 45-degree flat mirror 4 is clamped on the two-dimensional adjustment frame 6 fixed on the splicing translation stage 5, and the light emitted by the Fizeau interferometer 1 is 45 degrees; the second standard mirror 3 is clamped on the tilted two-dimensional adjustment 7, and placed above the ...

Embodiment 2

[0041] A sub-aperture splicing measurement device for 45-degree plane mirror shape detection, such as figure 1 As shown, the light emitted by the Fizeau interferometer 1 passes through the first standard mirror 2 with a nominal reflectivity of 4%, is reflected by a 45-degree flat mirror with a nominal reflectivity of 98%, and is reflected by a 45-degree flat mirror with a nominal reflectivity of 4%. After being reflected by the second standard mirror 3, the light returns along the original path. The first standard mirror 2 is clamped on the reference mirror adjustment frame 1-1 of the Fizeau interferometer placed horizontally; the 45-degree plane mirror 4 is clamped on the two-dimensional adjustment frame 6 fixed on the splicing displacement platform 5 to be connected with the Fizeau interferometer. The light emitted by the cable interferometer 1 is at 45 degrees; the second standard mirror 3 is clamped on the inclined two-dimensional adjustment frame 7, and placed above the 4...

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Abstract

A sub-aperture splicing measurement device for 45-degree plane mirror surface shape detection, including: Fizeau interferometer, first standard mirror, second standard mirror, 45-degree plane mirror, splicing translation platform, two-dimensional adjustment frame, inclined two-dimensional Adjustment stand. In the present invention, a reflector is added above the measured 45-degree plane mirror to return the light to the original path, and the sub-aperture splicing interferometric measurement is performed on the 45-degree plane mirror, and the sub-aperture surface data are spliced ​​by a variable weight method to obtain a full-aperture surface shape. The invention has the following advantages: 1. The operation is simple, the mirror surface of the 45-degree plane mirror is not easily deformed, and the measurement accuracy is high; 2. The sub-aperture surface shape data is fused and spliced ​​by variable weight data, and the precision is high; 3. By changing the first standard mirror and the second standard mirror It can measure both the uncoated surface and the high-reverse surface, all of which have the advantage of high interference contrast.

Description

technical field [0001] The invention relates to the field of sub-aperture splicing interferometric measurement, in particular to a device and method for detecting the shape of a 45-degree plane mirror. Background technique [0002] Sub-aperture splicing interferometry technology can realize high-precision measurement of large-aperture optical components at low cost. The initial sub-aperture splicing interferometry technology uses Zernike polynomials to describe the wavefront, and the full-aperture surface distribution based on Zernike polynomials can be obtained. (1. [Stephen C. Jensen, Weng, W. Chow, and George N. Lawrence. Subaperture testing approaches: a comparison [J]. APPLIED OPTICS, 1984, 23 (5): 740~745] and 2. [James E . Negro. Subaperture optical system testing [J]. APPLIED OPTIC, 1984, 23(12): 1921~1930). Stuhlinger proposed the discrete phase method. The wavefront is described by the optical phase values ​​of a large number of discrete points distributed on the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
Inventor 李永唐锋王向朝李杰吴飞斌
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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