A magnification adjustment method for a symmetrical bi-telecentric projection optical system

Abstract

The invention discloses a method for adjusting the magnification of a symmetrical bi-telecentric projection optical system, which includes: 1. A symmetrical bi-telecentric projection optical system is provided, and the projection optical system includes a front group, an aperture Diaphragm and rear group, the front group includes first to third lens groups, the first lens group has negative refractive power, the second and third lens groups have positive refractive power, and the rear group includes fourth to sixth lens groups, The fourth and fifth lens groups have positive refractive power, and the sixth lens group has negative refractive power; the front group and the rear group are symmetrical about the aperture stop and satisfy a certain relationship; 2. Simultaneously move the first and sixth two The lens in each lens group is used to adjust the projection magnification of the optical system. By adopting the magnification adjustment method of the present invention, various aberrations can be effectively corrected when optical materials with excellent performance are used, the size of the field of view at the image side can be enlarged, and the imaging resolution can be improved; The difficulty and cost of processing, testing and assembling are reduced.

Description

technical field [0001] The present invention relates to a method for adjusting the magnification of an optical system of a lithographic equipment for micromachining, and in particular to a method for adjusting a magnification of a symmetrical bi-telecentric projection optical system. The symmetrical bi-telecentric projection optical system is mainly used in micro Electromechanical systems (MEMS, Micro-Electro-MechanicalSystem), photolithography systems such as semiconductors, solar cells, liquid crystals, printed circuit boards, and projection optical systems for photolithography. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system is gradually improved, and the projection optical system can already be applied to various fields such as circuit manufacturing. Projection lithography technology can also be used in technical fields such as semiconductors, solar cells, liquid crystals, and print...

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Problems solved by technology

[0004] Chinese patent CN98113037.2 (announcement date: July 23, 2003) is a double Gaussian optical system with telecentric image space. Since the patent uses two glued surfaces, in high-yield projection lithography equipment, the lens The adhesive will produce great deformation or even denaturation, resulting in reduced optical imaging performance, shortened service life of the projection lens, and does not meet the requirements of lithography technology

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