Plasma processor
A plasma and processing device technology, applied in the field of plasma processing devices
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[0035] Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0036] figure 1 It is a figure schematically showing the structure of the plasma processing apparatus concerning embodiment of this invention.
[0037] exist figure 1 Among them, the plasma processing apparatus 10 includes a cuboid-shaped chamber 11 (processing chamber) whose interior is decompressed and a high-frequency power source 12. The chamber 11 has a table-shaped susceptor 13 arranged at the bottom and a The shower head 14 and the high-frequency power supply 12 are connected to the base 13 to supply high-frequency power to the base 13 . The susceptor 13 functions as a lower electrode, and the shower head 14 functions as an upper electrode. Thereby, the high-frequency power supplied to the susceptor 13 can be applied to the processing space S between the susceptor 13 and the shower head 14 .
[0038] In the chamber 11, a glass substrate (hereinafter simply ...
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