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Two-dimension cord design dynamic photoelectric targeting interferometry device

A technology of interferometric measurement and two-dimensional line pattern, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as the inability to meet the measurement requirements of two-dimensional line pattern templates, achieve good environmental adaptability, measurement accuracy, and overcome efficiency Low, the effect of improving accuracy

Inactive Publication Date: 2014-07-30
TIANJIN UNIV
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Problems solved by technology

Traditional optical image measurement cannot meet the measurement requirements of two-dimensional line patterns

Method used

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  • Two-dimension cord design dynamic photoelectric targeting interferometry device
  • Two-dimension cord design dynamic photoelectric targeting interferometry device
  • Two-dimension cord design dynamic photoelectric targeting interferometry device

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Embodiment Construction

[0066] The two-dimensional line dynamic photoelectric aiming interferometry device of the present invention will be described in detail below with reference to the embodiments and the accompanying drawings.

[0067] In the two-dimensional line pattern dynamic photoelectric aiming interferometry device of the present invention, the base body of the measurement device is made of a material with a low thermal expansion coefficient, and the heterodyne interferometry system is installed on the "zero" expansion structure frame to reduce the temperature caused by environmental temperature changes. The displacement measurement error caused by the change of the relative position relationship of the measurement system can improve the measurement accuracy.

[0068] like figure 1 As shown, the two-dimensional line pattern dynamic photoelectric aiming interferometry device of the present invention includes a base 1 and a zero-expansion measurement system structural frame 2 fixedly connecte...

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Abstract

A two-dimension cord design dynamic photoelectric targeting interferometry device is provided with a expansion-free measurement system structure framework fixedly connected with a base, two Y-axis movement guide rails are arranged on the base in parallel, two X-axis movement guide rails capable of sliding along the Y-axis movement guide rails are arranged on the two Y-axis movement guide rails, a sliding support capable of sliding along the X-axis movement guide rails is arranged on the two X-axis movement guide rails, the sliding support is provided with a worktable posture adjustment mechanism and a worktable measurement reflection mirror located on one side edge of the worktable posture adjustment mechanism, the expansion-free measurement system structure framework is provided with an interference measurement and posture measurement system, an interference laser source, an air refractive index compensation unit and a dynamic photoelectric microscope, the interference measurement and posture measurement system and the interference laser source correspond to the worktable measurement reflection mirror, and the air refractive index compensation unit and the dynamic photoelectric microscope correspond to the worktable posture adjustment mechanism. The two-dimension cord design dynamic photoelectric targeting interferometry device resolves the problem that an existing image method is promiscuous in traceability, improves the accuracy and adaptability of the current two-dimension cord design measurement result, and improves the accuracy of the measurement result.

Description

technical field [0001] The invention relates to a measuring device. In particular, it relates to a two-dimensional line pattern dynamic photoelectric aiming interferometry device capable of realizing accurate measurement of a large-size two-dimensional line pattern plate. Background technique [0002] Accurate measurement and calibration of two-dimensional line patterns is of great significance in ultra-precision processing, microelectronics processing industry, precision instrument manufacturing and other industries, especially in the acceptance and calibration of measuring instruments using two-dimensional line patterns as standards It plays a role in ensuring the accuracy and reliability of the value during maintenance and maintenance. At present, the measurement of two-dimensional line patterns is based on the measurement target of two-dimensional plane graphics, which is usually realized by optical microscopes based on the principle of image measurement. Since the meas...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02
Inventor 朱振宇李华丰兰一兵傅星王霁朱国勤
Owner TIANJIN UNIV
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