Preparation method of substrate

Abstract

The invention discloses a preparation method of a substrate, which relates to a display field. The preparation method realizes accurate alignment of the pattern of a black matrix, and aperture ratio and yield of the substrate can be ensured. The preparation method of the substrate comprises the following steps: forming an align mark; forming a black resin layer, wherein the align mark is covered by the black resin layer; arranging a heat conduction contact on an opposed face of the align mark on the substrate, arranging the heat conduction contact by corresponding with the align mark; and pre-baking the black resin layer.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for preparing a substrate. Background technique [0002] In recent years, people have higher and higher requirements on light transmittance, resolution, and power consumption of display devices, and display devices are developing towards high transmittance, high resolution, and low power consumption. Among them, the higher the resolution, the smaller the size of each pixel unit. When the side length of the pixel unit changes from tens of microns to more than ten microns, obviously, the size of the pixel unit has been greatly reduced. At this time , if the width of the black matrix dividing the pixel units remains unchanged, the black matrix will become obvious relative to the pixel units, which will affect the display effect of the display device. [0003] Therefore, one of the integration technologies (Color Filter on Array, COA for short) that integrates the color fi...

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Problems solved by technology

[0004] The inventors found that since the pattern of the black matrix of the COA substrate needs to be precisely aligned with the structure under the black matrix such as gate lines and data lines, alignment marks are usually formed on the COA substrate to facilitate the exposure machine to perform black matrix At the same time, the black matrix must reach a certain thickness to achieve its functions of shading and improving contrast. At this time, the black matrix will affect the exposure machine to recognize the alignment mark, resulting in the pattern of the black matrix cannot be accurately aligned, affecting Aperture ratio and yield rate of COA substrate

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