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Film thickness monitoring method of optical film and irregular film system optical film thickness instrument

A technology of optical thin film and film thickness, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of high equipment stability, difficulty in obtaining good repeatability, and cumbersome processing operations. Achieve the effects of eliminating light source fluctuations, improving anti-interference ability, and meeting preparation requirements

Inactive Publication Date: 2014-06-11
XIAN TECHNOLOGICAL UNIV
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Problems solved by technology

[0025] The present invention has to overcome the low precision existing in the prior art, difficulty in obtaining good repeatability, cumbersome follow-up processing operations, high requirements for equipment stability and cost high problem

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  • Film thickness monitoring method of optical film and irregular film system optical film thickness instrument
  • Film thickness monitoring method of optical film and irregular film system optical film thickness instrument
  • Film thickness monitoring method of optical film and irregular film system optical film thickness instrument

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Embodiment Construction

[0042] see figure 1 The optical extremum method is to use the rule that the reflectivity (or transmittance) changes with the film thickness during the deposition process of the film layer, and detect the extreme value of the reflectance (or transmittance) during the deposition process through the photoelectric film thickness monitor Points to monitor films that are integer multiples of a quarter wavelength.

[0043] The traditional optical film thickness meter used: a single optical path is used, and the fluctuation of light source brightness will directly affect the fluctuation of the signal; the film thickness meter selects monochromatic light through a monochromator, and measures the monochromaticity of the optical signal by the monochromator Influenced by itself and the size of the slit, the monochromaticity is worse than that of the laser, the optical signal is weak, and the signal-to-noise ratio is poor; the optical signal is usually received by a photomultiplier tube, ...

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Abstract

The invention relates to a film thickness monitoring method of an optical film and an irregular film system optical film thickness instrument. The prior art has the problems of low precision, difficulty in better repeatability, complicated subsequent treating operation, higher requirement of stabilization degree, and high cost. The film thickness monitoring method of the optical film comprises the steps: preplating by adopting same films; regulating; eliminating direct current components; and obtaining an approximate triangular wave through mathematical treatment. The irregular film system optical film thickness instrument comprises a laser source of a single wavelength, a comparing sheet, a photoelectric detector, an amplifier and a computer, wherein a modulator and a beam splitter are arranged on an emergent light path, four same films are arranged on the comparing sheet for being preplated, and are films with optical thickness difference of lambda / 8; and a four-quadrant detector is adopted as the photoelectric detector. The film thickness monitoring method disclosed by the invention realizes monitoring of an irregular film system; and the irregular film system optical film thickness instrument is high in measurement precision and stable in signal.

Description

Technical field [0001] The present invention involves the field of optical film performance testing technology, which specifically involves a membrane thick monitoring method of an optical film and a levy film -based optical thinner. Background technique [0002] Optical film refers to the characteristics of electromagnetic theory and multi -light beam interference generated by a single layer or multi -layer thin film to change the characteristics of transmission or reflection light, polarizing status, and phase., Narrow belt, color division film and other films, eventually satisfy the spectral characteristics we need. [0003] Optical film with good plating performance, in addition to the need to choose the appropriate evaporation process and use high -quality membrane thick materials, it is also necessary to accurately monitor the thickness of each layer of film.The spectrum characteristics of the optical film are closely related to each layer of the membrane. In order to coord...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/52
Inventor 弥谦杭凌侠潘永强
Owner XIAN TECHNOLOGICAL UNIV
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