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High-image-quality projection optical system of ultraviolet band

A projection optical system and ultraviolet band technology, applied in the field of projection optics, can solve problems such as poor image quality, achieve the effects of improving lithography resolution, good imaging characteristics, and reducing the difficulty of assembly and integration

Inactive Publication Date: 2014-04-02
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0007] In order to solve the problem of poor image quality of existing lithographic objects, the present invention proposes a high-quality projection optical system with a working wavelength of 193nm and a numerical aperture of 0.75. The lens has the advantages of high image quality and compact structure, and can be used The image of the object plane will be reduced by 0.25 times and imaged into the image plane

Method used

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  • High-image-quality projection optical system of ultraviolet band

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Embodiment Construction

[0028] In order to better illustrate the purpose and advantages of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0029] figure 1 It is a schematic layout diagram of the high-image-quality projection optical system in the ultraviolet band of the present invention. 23 optical elements form transmission group 1, transmission group 2, transmission group 3, transmission group 4, transmission group 5, transmission group 6, and transmission group 7, sequentially from Beam incident direction setting.

[0030] The transmission group 1 is a transmission group with positive refractive power, including the first flat protective window 1, the first positive lens 2, and the first negative lens 3. The light is projected from the object plane and converged by the transmission group 1 before entering the transmission group 2.

[0031] The transmission group 2 is a transmission group with n...

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Abstract

The invention provides a high-image-quality projection optical system of an ultraviolet band. The high-image-quality projection optical system is used for imaging an image on an object plane into an image plane. The high-image-quality projection optical system of the ultraviolet band comprises a transmission group 1, a transmission group 2, a transmission group 3, a transmission group 4, a transmission group 5, a transmission group 6 and a transmission group 7 which are arranged along the optical axis direction and are sequentially distributed from the incidence direction of a light beam; the transmission group 1 has positive focal power, the transmission group 2 has negative focal power, the transmission group 3 has positive focal power, the transmission group 4 has the negative focal power, the transmission group 5 has the negative focal power, the transmission group 6 has the positive focal power, and the transmission group 7 has the positive focal power. The high-image-quality projection optical system of the ultraviolet band has the advantages of high image quality, compact structure and the like, and the image of the object plane can be narrowed for 0.25 time to be imaged into the image plane.

Description

technical field [0001] The invention belongs to the technical field of projection optics, and in particular relates to a high-image-quality projection optical system in the ultraviolet band, which is an aspheric ultraviolet lithography objective lens used in lithography technology and semiconductor element manufacturing devices. Background technique [0002] Optical projection lithography is an optical exposure process that uses the principle of optical projection imaging to transfer high-resolution patterns to rubber-coated silicon wafers by step-and-repeat or step-and-scan exposure of IC patterns on the mask. Optical projection lithography is developed on the basis of contact and proximity lithography. The use of projection lithography can prolong the service life of the mask, and if the projection objective lens with reduced magnification is used, it is also convenient for mask production. Optical projection lithography has experienced the development of stepper and scan...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/18G02B27/00G03F7/20
Inventor 白瑜邢廷文林妩媚朱红伟吕保斌邓超廖志远
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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