form includes i 2 -ii-iv-vi 4 and i 2 -(ii,iv)-iv-vi 4 Method for semiconductor film including semiconductor film and electronic device including same
A semiconductor and conductive material technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of hydrazine flammability, limited desirability, hepatotoxicity and carcinogenicity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
example
[0064] Examples of fabricating semiconductor films and electronic devices according to embodiments of the present invention are described below, and some experimental results are presented. It will be apparent to those skilled in the art that various modifications can be made in both materials and methods without departing from the scope of the invention.
[0065] Formation of semiconductor film
[0066] The coating solution to form the CZTS film was prepared by the following method: at room temperature, 0.8 mmol Cu(CH 3 COO)2 ·H 2 O (99.99%, obtained from Aldrich), 0.56 mmol ZnCl 2 (99.1%, obtained from Mallinckrodt Baker), 0.55 mmol SnCl 2 2H 2 O (99.995%, obtained from Aldrich) and 2.64 mmol thiourea (99%, obtained from Aldrich) were dissolved in 0.7 mL of dimethyl sulfoxide (DMSO) (99%, obtained from Aldrich). CZTS films were obtained by spin-coating the coating solution on Mo / SLG substrates followed by annealing at 580 °C on a hot plate. Spin coating was performed a...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com