Organic electroluminescent device and preparation method thereof
An electroluminescent device and electroluminescent technology, which are applied in the fields of electro-solid devices, chemical instruments and methods, semiconductor/solid-state device manufacturing, etc., can solve the problem of low display index, and achieve the effect of high color rendering index and rich spectrum.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0066] see figure 2 , the preparation method of the organic electroluminescent device of an embodiment, comprises the following steps:
[0067] Step S110: providing a substrate.
[0068] The substrate can be transparent glass or polyethersulfone resin substrate.
[0069] The substrate is first cleaned to avoid adverse effects of contaminants on the substrate on the performance of the organic electroluminescent device. Place the substrate in deionized water containing detergent for ultrasonic cleaning. After cleaning, treat it with isopropanol and acetone in ultrasonic for 20 minutes, then dry it with nitrogen, and set it aside.
[0070] Step S120: forming an anode on the substrate by magnetron sputtering.
[0071] After the substrate was cleaned and dried, indium tin oxide (ITO) was deposited on the substrate by magnetron sputtering to form an ITO film as the anode.
[0072]An indium-doped zinc oxide (IZO) film, an aluminum-doped zinc oxide (AZO) film or a gallium-doped z...
Embodiment 1
[0109] The structure is: Glass / ITO / F6-TNAP:MeO-TPD / ZnPc / Ir(MDQ) 2 (acac):Ir(ppy) 3 :CBP / TPD / Rubrene / FIrpic:TPBi / BAlq / CsN 3 : The organic electroluminescent device of Bphen / Ag;
[0110] The fabrication process of the device is as follows:
[0111] (1) Provide transparent glass as a substrate, denoted as Glass. Put the transparent glass in deionized water containing detergent for ultrasonic cleaning. After cleaning, use isopropanol and acetone in ultrasonic treatment for 20 minutes, and then blow dry with nitrogen;
[0112] (2) Magnetron sputtering is used to deposit an indium tin oxide (ITO) film on the surface of the cleaned and dried transparent glass as an anode with a thickness of 100 nm. After the anode is prepared, put the anode laminated on the surface of the transparent glass into the plasma treatment chamber for 10 minutes;
[0113](3) A hole transport layer is formed on the surface of the anode by vacuum evaporation. Vacuum degree is 5×10 -4 Pa. The hole trans...
Embodiment 2
[0126] The structure is: Glass / ITO / F4-TCNQ:MeO-TPD / CuPc / Ir(MDQ) 2 (acac):Ir(ppy) 3 :mCP / TCTA / Rubrene / FCNIrpic:TPBi / PBD / Li 2 CO 3 : PBD / Ag organic electroluminescence device;
[0127] The fabrication process of the device is as follows:
[0128] (1) Provide transparent glass as a substrate, denoted as Glass. Put the transparent glass in deionized water containing detergent for ultrasonic cleaning. After cleaning, use isopropanol and acetone in ultrasonic treatment for 20 minutes, and then blow dry with nitrogen;
[0129] (2) Magnetron sputtering is used to deposit an indium tin oxide (ITO) film on the surface of the cleaned and dried transparent glass as an anode with a thickness of 70 nm. After the anode is prepared, put the anode laminated on the surface of the transparent glass into the plasma treatment chamber for 10 minutes;
[0130] (3) A hole transport layer is formed on the surface of the anode by vacuum evaporation. Vacuum degree is 5×10 -4 Pa. The hole transp...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com