Composite template for nano-imprinting and preparation method of composite template

A composite template and nano-imprinting technology, which is applied in the field of nano-imprinting, can solve the problems of high cost of electron beam direct writing technology, and achieve the effect of high binding energy and improved compactness

Inactive Publication Date: 2014-02-12
WUXI IMPRINT NANO TECH
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, lithography technology has formed a bottleneck at the 45nm node; and the cost of electron beam direct writing technology is relatively high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Composite template for nano-imprinting and preparation method of composite template

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0025] (1) Preparation of silica-elastomer composite template:

[0026] 1) The elastomer (take SEBS as an example) is made into a smooth and flat film by hot embossing:

[0027] a) Weigh 3.2g of elastomer, place it between two layers of clean PET films, place it in the chamber of the embosser, set the temperature at 200°C, and the pressure at 0.1MPa, and make the elastomer form a film by hot pressing;

[0028] b) Place the preliminarily formed film in the previous step between two 4-inch anti-adhesive silicon sheets, and heat press again to form a smooth elastomeric film.

[0029] 2) Use the nickel template obtained by electroplating to imprint to form a nano-lattice structure on the surface of the film:

[0030] The elastomer and the nickel template are closely attached, placed in the cavity of the imprinter, and the structure on the nickel...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the technical field of nano-imprinting, particularly discloses a composite template for the nano-imprinting and a preparation method of the composite template and aims to produce a nano-imprinting template having the characteristics of small size, large area, easiness in demolding and recyclable use. The preparation method comprises the following steps of firstly, preparing an elastic body membrane by utilizing thermal imprinting manner; secondly, obtaining a nanostructure on the surface of the elastic body membrane in a thermal imprinting manner; thirdly, depositing a silicon dioxide transition layer on the nanostructure by utilizing a PECVD (Plasma Enhanced Chemical Vapor Deposition) method; finally, carrying out adhesion prevention treatment by utilizing chlorosilane, thus obtaining the composite template. The composite template prepared by utilizing the preparation method comprises a silicon dioxide layer, and the silicon dioxide layer has high elasticity modulus, so that the high resolution is guaranteed; as an elastic body layer has good elasticity, the fitting tightness of the composite template with a substrate during imprinting is improved.

Description

technical field [0001] The invention belongs to the technical field of nano-imprinting, and in particular relates to an elastomer template in nano-imprinting and a preparation method thereof. Background technique [0002] With the development of the semiconductor industry, the reliability requirements for image transfer are getting higher and higher. At present, photolithography technology has formed a bottleneck at the 45nm node; and electron beam direct writing technology has a relatively high cost. Another micro-nano manufacturing technology—nanoimprint technology has the advantages of high yield, low cost, and simple process, so it has attracted widespread attention. [0003] In nanoimprint technology, the template as the initial carrier of the imprinted pattern directly affects the quality of the imprinted structure. Only high-quality stencils can guarantee high-quality embossed graphics. Therefore, how to make a small-scale, large-area, easy-to-release, and reusable...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 陈辉婷胡昕袁长胜
Owner WUXI IMPRINT NANO TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products