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Sandwich type graphene saturable absorber and preparation method thereof

A sandwich type, graphene technology, applied in laser parts, electrical components, lasers, etc., can solve the problems of complex, expensive, complicated experimental equipment, etc., and achieve the effect of short recovery time, low saturation intensity and low cost

Active Publication Date: 2014-01-08
SHANDONG NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the disadvantage of the passive mode-locking technology of semiconductor saturable absorber mirrors is that the manufacture of semiconductor saturable absorber mirrors requires a relatively complex and expensive clean room manufacturing system, and the typical recovery time of such devices is about several nanoseconds (10 -9 s)
However, nitrogen gas needs to be kept in the experimental process, and the experimental equipment is relatively complicated.

Method used

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  • Sandwich type graphene saturable absorber and preparation method thereof
  • Sandwich type graphene saturable absorber and preparation method thereof
  • Sandwich type graphene saturable absorber and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0028] A preparation method of a sandwich type graphene saturated absorber, comprising the following steps:

[0029] (1) Prepare single-layer graphene on Cu foil by CVD method. The specific operation is: place the Cu foil in the constant temperature zone of the quartz tube, and seal the quartz tube completely; use a vacuum pump to pump the air pressure in the quartz tube to the limit vacuum state3 ×10 -6 At the same time, the temperature was raised to the growth temperature of 1050°C; after reaching the growth temperature, 50 sccm of hydrogen gas was introduced for annealing for 30 minutes, and then 50 sccm of methane gas was introduced; after 50 min of growth, the carbon source gas was turned off and the temperature was rapidly lowered under the hydrogen atmosphere.

[0030] (2) The graphene was transferred to the glass substrate by wet transfer technology. The specific operation was: cut the Cu foil deposited with graphene into a 15 mm × 15 mm square, and evenly rotate it on...

Embodiment 2

[0034] A preparation method of a sandwich type graphene saturated absorber, comprising the following steps:

[0035] (1) Prepare single-layer graphene on Cu foil by CVD method. The specific operation is: place the Cu foil in the constant temperature zone of the quartz tube, and seal the quartz tube completely; use a vacuum pump to pump the air pressure in the quartz tube to the limit vacuum state 2 ×10 -6 At the same time, the temperature was raised to the growth temperature of 1000°C; after reaching the growth temperature, 50 sccm of hydrogen gas was introduced for annealing for 30 minutes, and then 50 sccm of methane gas was introduced; after 50 min of growth, the carbon source gas was turned off and the temperature was rapidly cooled under the hydrogen atmosphere.

[0036] (2) Transfer the graphene to the glass substrate by using the wet transfer technique. The specific operation is: cut the Cu foil deposited with graphene into a 20 mm × 20 mm square, and evenly spin on the...

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Abstract

The invention provides a sandwich type graphene saturable absorber and a preparation method thereof. The sandwich type graphene saturable absorber comprises a bottom layer substrate material, a graphene layer coated on the bottom layer substrate material, and an upper layer substrate material, wherein the three layers are contacted tightly to form a sandwich type structure; a uniform sealing glue-coated layer is formed on the periphery of the sandwich type structure. The method comprises the following steps: depositing a single-layer graphene film on a copper foil; transferring the graphene onto a transparent substrate material by using a wet method transferring technology; placing the same substrate material on the substrate material to which the graphene is attached; compacting to exhaust air between the substrate materials; uniformly coating sealing glue on the periphery of the substrate material to obtain the sandwich type graphene saturable absorber. According to the sandwich type graphene saturable absorber, the graphene can be prevented from undergoing an oxidation reaction with oxygen under laser irradiation, the laser damage resistance threshold of the graphene is increased, and the output power of pulse laser is increased finally.

Description

technical field [0001] The invention relates to a graphene saturable absorber and a preparation method thereof, belonging to the technical field of ultrashort pulse solid laser saturable absorber preparation. Background technique [0002] The many characteristics of ultrashort pulse laser make it applicable in many fields. In order to obtain such a widely used ultrashort pulse laser, it is generally realized by mode-locking technology. Picoseconds (10 -12 s) and even femtoseconds (10 -15 s) level ultrashort pulse and its system structure is simple and favored. Passive mode-locking is to use the characteristics of nonlinear absorption or nonlinear phase transition of materials to generate ultrashort laser pulses. Common commercial nonlinear materials include semiconductor saturable absorber mirrors, etc. However, the disadvantage of the passive mode-locking technology of semiconductor saturable absorber mirrors is that the manufacture of semiconductor saturable absorber m...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/11
Inventor 姜守振张超许士才满宝元刘杰刘玫杨诚
Owner SHANDONG NORMAL UNIV
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