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Control method of coating thickness of quartz crystal and coating device of quartz crystal

A quartz crystal, thickness control technology, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of increasing the difficulty and cost of film formation, lack of monitoring means for thin layers, etc., and achieve convenient operation , Improve controllability, improve the effect of film thickness accuracy

Active Publication Date: 2013-12-25
SHANGHAI MOLIN TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, in the film forming stage, the lack of effective and accurate monitoring methods for the thin layer increases the difficulty and cost of film forming

Method used

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  • Control method of coating thickness of quartz crystal and coating device of quartz crystal
  • Control method of coating thickness of quartz crystal and coating device of quartz crystal
  • Control method of coating thickness of quartz crystal and coating device of quartz crystal

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Such as figure 1 Shown is a quartz crystal coating device, which includes a vacuum chamber 10 and a controller 20 . The bottom of the vacuum chamber 10 is provided with an evaporating container 30 which can contain coating materials. The crystal controller 20 is communicatively connected with the evaporation container 30 through the evaporation container controller 21 . A movable baffle 40 is arranged above the evaporation container 30 . The crystal controller 20 communicates with the baffle 40 through the baffle controller 22 . The upper part of the vacuum chamber 10 is provided with a crystal oscillator probe 50 and a bracket 70 for fixing the sample sheet 60 . The crystal oscillator probe 50 is provided with a quartz crystal plate 51 . The crystal oscillator probe 50 is in contact with the cooling water circulation device 80 . The cooling water circulation device 80 is installed in the upper part of the vacuum chamber 10 through the vacuum flange 81 . The cryst...

Embodiment 2

[0050] The difference between this embodiment and Embodiment 1 lies in the method for determining the frequency compensation value, and the rest are the same as Embodiment 1.

[0051] The method for determining the frequency compensation value in this embodiment is: when the coating stops, record the frequency of the coated crystal; The difference between the frequency values ​​at these two temperatures is used as the frequency compensation value.

[0052] After the coating is completed, the evaporation source is turned off, and the temperature of the crystal probe starts to drop from the highest point until the temperature does not change any more. There is a temperature difference between the two equilibrium states. The so-called temperature time constant in this embodiment refers to the length of time required for the temperature of the crystal oscillator probe to drop from the highest temperature until it drops by 63% of the temperature difference. That is, assuming that ...

Embodiment 3

[0056] The difference between this embodiment and Embodiment 1 is that the coating thickness is displayed through the calculation of the crystal controller 20 . The frequency compensation value is converted into a thickness compensation value by the crystal controller 20 . The thickness compensation value is added to the film layer thickness converted from the front and back frequencies of the quartz crystal plate 51 detected by the crystal controller 20, and the actual thickness value is directly output.

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Abstract

The invention provides a control method of coating thickness of a quartz crystal, wherein the coating thickness is calculated according to the initial oscillation frequency of the quartz crystal before coating and the oscillation frequency of the quartz crystal after coating. The control method is characterized in that thickness measurement errors caused by rise of the oscillation frequency of the quartz crystal due to temperature increment of the quartz crystal are reduced. The coating device of the quartz crystal, provided by the invention, is convenient to operate, and the work efficiency is improved. A film thickness controller of the quartz crystal provided by the invention adopts a human-machine interface and is convenient for operators to monitor the coating process in real time and analyze the film forming data, thereby improving the controllability of the coating process. By adopting the control method and the device provided by the invention, the error on the coating thickness can be reduced to below 1 / 4 of the error in the prior art, so that the precision on the coating thickness is greatly improved.

Description

technical field [0001] The invention relates to a method for controlling the thickness of a quartz crystal coating film and a quartz crystal coating device. Background technique [0002] Thickness is one of the most important parameters of optical films. Decisively affect the mechanical properties, electrical properties and optical properties of the film. On the other hand, almost all thin film properties are thickness dependent. Therefore, accurately controlling the thickness of the film becomes the key to preparing optical films with excellent properties. [0003] One of the quartz crystal film thickness controllers (referred to as the crystal controller) controls the coating thickness through a crystal oscillator. The principle is to use the relationship between the resonant frequency of the quartz crystal plate (referred to as crystal plate, crystal oscillator plate, and crystal control plate) and the film thickness to monitor the film thickness and coating rate. It ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/24
Inventor 张子业汤兆胜
Owner SHANGHAI MOLIN TECH CO LTD
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