Seam line optimization method based on long-span region extraction
A technology of area extraction and optimization method, which is applied in image analysis, instrumentation, graphics and image conversion, etc., can solve problems such as difficult seams, and achieve the effect of improving quality and maintaining integrity
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[0032] The present invention will be further described below in conjunction with the embodiments shown in the accompanying drawings.
[0033] In this embodiment, for digital orthophoto images, each seam line to be optimized with a known starting point and ending point is optimized, and the specific steps are as follows:
[0034] Step 1, calculating the difference of pixels in the overlapping area; including the following sub-steps,
[0035] Step 1.1, for the left and right digital orthophotos involved in the seamline to be optimized, calculate the overlapping area between the images (such as figure 1 , figure 2 shown);
[0036] Step 1.2, calculate the difference of pixels in the overlapping area;
[0037] Establish a two-dimensional matrix (cost matrix) according to the overlapping area, which is used to represent the difference of pixels in the overlapping area. The width and height of the matrix are the width and height of the bounding rectangle of the overlapping area; ...
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