Optical proximity correction method
An optical proximity correction, adjacent edge technology, applied in optics, originals for opto-mechanical processing, special data processing applications, etc., can solve the problem of limited optical proximity correction effect, etc. Circulation, the effect of improving efficiency
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[0028] In the existing optical proximity correction method, the simulated graph is compared with the target graph to obtain the edge placement error (EPE). When the edge placement error (EPE) exceeds a predetermined value, the corresponding correction edge will move outward , Get the corrected mask pattern, then re-simulate the corrected mask pattern to obtain the re-simulated simulation pattern, and then compare the re-simulated simulated pattern with the target pattern to obtain the edge position error and judge whether the edge position error exceeds the predetermined Value, and so on, until the edge position error is within the predetermined value.
[0029] In order to improve the practical application ability of optical proximity correction, mask rule check (MRC) is also applied to the existing optical proximity correction (OPC) process, that is, between the corrected mask pattern and the adjacent mask pattern The distance must be greater than the minimum design size of the ...
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