Solvent-based light oil suitable for offset press
A solvent-based, offset printing machine technology, applied in textiles and papermaking, fiber raw material processing, paper coating, etc., can solve the problems of hot stamping, water-based varnish and silk screen printing ink, etc., to reduce ink loss Possibility, bronzing adaptability stability, effect of improving compatibility
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0025] Embodiment 1, a kind of solvent-based varnish suitable for offset printing machine is made of the following raw materials in weight percentage: 15% polyvinyl butyral, 8% rosin modified maleic acid resin, 41.4% ethanol , 5% propylene glycol monoethyl ether, 30% isopropanol and 0.6% palm wax.
[0026] Its preparation method is as follows: weigh each component according to the above weight percentage, then add the weighed polyvinyl butyral, rosin-modified maleic acid resin, ethanol, propylene glycol monoethyl ether, isopropanol and palm wax into a high-speed mixer , stirred at a speed of 3000 rpm for half an hour, so that the components were fully dispersed, and a solvent-based varnish suitable for offset printing machines was obtained.
Embodiment 2
[0027] Embodiment 2, a kind of solvent-based varnish suitable for offset printing machines is made of the following raw materials in weight percentage: 13% polyvinyl butyral, 10% rosin modified maleic acid resin, 40% ethanol , 6% propylene glycol monoethyl ether, 30% isopropanol and 1% palm wax. Its preparation method is the same as that of Example 1, and will not be repeated here.
Embodiment 3
[0028] Embodiment 3, a kind of solvent-based varnish suitable for offset printing machine is made of the following raw materials in weight percentage: 18% polyvinyl butyral, 6% rosin modified maleic acid resin, 45% ethanol , 5.5% propylene glycol monoethyl ether, 25% isopropanol and 0.5% palm wax. Its preparation method is the same as that of Example 1, and will not be repeated here.
PUM
Property | Measurement | Unit |
---|---|---|
melting point | aaaaa | aaaaa |
density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com