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Photoinitiator mixture of novel aromatic hydroxyl ketone and acylphosphine oxide, and composite system of photoinitiator mixture and photoabsorber

A technology of aromatic hydroxyketone and photoinitiator, which is applied in the field of light radiation curing, and can solve the problems of significant air oxygen resistance effect and poor surface drying effect of cured coatings, etc.

Inactive Publication Date: 2013-05-01
SHENZHEN UV-CHEMTECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A characteristic disadvantage of phosphono compounds in practical applications is that their air oxygen barrier effect is significant when polymerization is initiated, which makes the surface curing effect of the cured coating containing them not good.

Method used

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  • Photoinitiator mixture of novel aromatic hydroxyl ketone and acylphosphine oxide, and composite system of photoinitiator mixture and photoabsorber
  • Photoinitiator mixture of novel aromatic hydroxyl ketone and acylphosphine oxide, and composite system of photoinitiator mixture and photoabsorber
  • Photoinitiator mixture of novel aromatic hydroxyl ketone and acylphosphine oxide, and composite system of photoinitiator mixture and photoabsorber

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Embodiment one: UV white wood coating

[0059] 77.2 parts of PEA, 5.9 parts of HDDA, 2.9 parts of TMPTA, 2.5 parts of acylphosphine oxide photoinitiator, 1.5 parts of hydroxyketone photoinitiator, 10 parts of TiO 2 .

[0060]

Embodiment 2

[0061] Example 2: UV floor matt finish

[0062] 14.78 parts of high-gloss UP (VP LS2100), 14.78 parts of Tromox R KB6, 7.39 parts of Banc-Fixe N, 1.18 parts of Lancowax HM 1666, 2.95 parts of TPGDA, mixed and ground to below 10 microns and then added 14.78 parts of high-gloss UP (VP LS2100 ), 5.91 parts of Gasil EBN, 35.47 parts of TPGDA, 0.06 parts of BYK 300, 1 part of acylphosphine oxide photoinitiator, and 1.7 parts of hydroxyketone photoinitiator.

[0063]

Embodiment 3

[0064] Embodiment three: UV automotive primer

[0065] 55.17 parts aliphatic PUA (VP LS 2258), 1.65 parts EB168, 10.98 parts POEA, 10.98 parts talc, 10.98 parts clay, 5.49 parts Heucophos ZPA, 1.38 parts TiO 2 , 0.08 parts of auxiliary agent Bayferrox 303T, 2.46 parts of hydroxyketone photoinitiator, 0.83 part of acyl phosphine oxygen photoinitiator.

[0066]

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PUM

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Abstract

The invention discloses a novel photoinitiator system compounded by using aromatic hydroxyl ketone and acylphosphine oxide compounds, and an alkene-containing unsaturated system which can be cured through light (ultraviolet light or visible light or equivalent light sources) irradiation. The alkene-containing unsaturated system is obtained by compounding the photoinitiator system and an appropriate hydroxybenzotriazole photoabsorber with a red-shift light absorption characteristic.

Description

【Technical field】 [0001] The present invention relates to the technical field of photoradiation curing, in particular to a novel photoinitiator system composed of some aromatic hydroxy ketones and acyl phosphine oxide compounds, and this type of photoinitiator system and suitable hydroxybenzos with red-shifted light absorption characteristics. An ethylenically unsaturated system that can be cured by light (ultraviolet light or visible light or equivalent light source) radiation formed by compounding triazole light absorbers. 【Background technique】 [0002] Phosphono compounds are important photoinitiators, which have been disclosed extensively in patent literature, such as EP1106627A1, EP0615980A2, WO2006056541A1, WO2011003772A1, CN1823077A, CN1659175A, etc. A characteristic disadvantage of phosphono compounds in practical applications is that they have a significant air oxygen barrier effect when initiating polymerization, which makes the surface curing effect of the cured ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F2/48C09D4/00C09D7/12C09D11/00
CPCC07C49/82C07F9/3252C08F2/48C07F9/5337C08F2/50C07F9/657181
Inventor 王智刚张永波王衍超宋怀海
Owner SHENZHEN UV-CHEMTECH CO LTD
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