Nano-grade high-precision-control hot filament chemical vapor deposition thin film material growth device

Abstract

The invention discloses a hot filament chemical vapor thin film deposition growth device based on nano-grade high-precision online control. According to the invention, besides a vacuum system, a gas path system, and a power supply control system which are connected and which are traditionally arranged outside a deposition chamber, the device comprises a novel design that a nano-grade high-precision servo system, a thin film morphology monitoring system, and a wide-range deposition stage temperature control system are combined and arranged in the deposition chamber. The nano-grade high-precision servo system is used for precisely controlling the distance, and nano-grade high-precision thin film deposition growth thickness and speed. With the nano-grade high-precision-control hot filament chemical vapor deposition thin film material growth device provided by the invention, position and thin film deposition growth speed and morphology can be controlled online with nano-grade high precision. With precise controlling over position and temperature, hot filament chemical vapor thin film deposition growth is always under optimal states such as fastest deposition speed, minimal defect, and the like.

Description

technical field [0001] The invention relates to nanoscale high-precision control hot wire chemical vapor deposition growth film material equipment, especially nanoscale control precision in three-dimensional space, which is suitable for a wide temperature range (-196 to 300°C) under the background of extremely high temperature (2000°C) ) within the nanoscale high-precision control. Background technique [0002] Hot wire chemical vapor deposition equipment is widely used in the current industrialization to grow thin film coatings and thick film materials. The temperature field, plasma field, and corresponding deposition field in the deposition equipment are all distributed in a cylindrical shell with the tungsten and tantalum hot wire as the axis, and the radial distribution gradient along the cylinder is quite large. During the operation of the hot wire equipment, there are two conditions that are not conducive to the good growth of the film. The first unfavorable factor is...

AI Technical Summary

Problems solved by technology

[0002] Hot wire chemical vapor deposition equipment is widely used in the current industrialization to grow thin film coatings and thick film materials. The temperature field, plasma field, and corresponding deposition field in the deposition equipment are all distributed in a cylindrical shell with the tungsten and tantalum hot wire as the axis, and the radial distribution gradient along the cylinder is quite large

During the operation of the hot wire equipment, there are two conditions that are not conducive to the good growth of the film. The first unfavorable factor is that when the hot wire is in a very high temperature state (2000 ° C), obvious thermal creep will occur, that is, the high temperature will slowly become longer; The second bad situation is that the heating wire itself is aging during use, that is, the plasma excitation ability is reduced, and its deposition field is constantly changing.

Images