Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Resin solution containing amine oxide group and resin composition for hair cosmetic material using the same

A technology for hair cosmetic and resin composition, which can be applied in the directions of cosmetics, cosmetic preparations, hair care, etc., and can solve problems such as quality reduction

Inactive Publication Date: 2013-03-20
MITSUBISHI CHEM CORP
View PDF8 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The raw material monomers of the amine oxide-containing resin are polymerizable, so there is a possibility that the monomers are stimulated by light, heat, etc. to polymerize during storage or transportation, resulting in a decrease in quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Resin solution containing amine oxide group and resin composition for hair cosmetic material using the same
  • Resin solution containing amine oxide group and resin composition for hair cosmetic material using the same
  • Resin solution containing amine oxide group and resin composition for hair cosmetic material using the same

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0073] When the polymerization inhibitor content of the amine oxide group-containing resin solution used in the preparation of the resin composition for hair cosmetics exceeds 800 ppm of the content of the amine oxide group-containing resin, there is a problem of coloring, which is not ideal as a resin composition for hair cosmetics. The less the polymerization inhibitor content in the amine oxide-containing resin solution, the better, more preferably below 750ppm of the amine oxide-containing resin, more preferably below 600pprn, even more preferably below 500ppm, even more preferably below 400ppm, Particularly preferably, it is 250 ppm or less.

[0074] In addition, the amine oxide group-containing resin solution referred to here is an amine oxide group-containing resin solution used as a raw material for the production of a resin composition for hair cosmetics supplied from the production process of the amine oxide group-containing resin as described above. Amino resin, wat...

Embodiment

[0217] The following production examples and examples are given to describe the present invention more specifically.

[0218] In addition, hereinafter, "part" means "weight part", and "%" and "ppm" mean "weight%" and "weight ppm", respectively.

[0219] In addition, all the raw material monomers used were manufactured by Mitsubishi Rayon Co., Ltd., and the concentration of MEHQ with respect to the weight of each monomer is shown below.

[0220] Dimethylaminoethyl methacrylate: 2000ppm

[0221] Lauryl methacrylate: 1000ppm

[0222] Tert-butyl methacrylate: 200ppm

[0223] In addition, the above-mentioned raw material monomers, the MEHQ concentration of the produced resin solution, etc. were analyzed and obtained by the following method.

[0224]

[0225] Gas chromatograph: "HP6850 series GC system" manufactured by Hewlett-Packard Co., Ltd. was used for measurement under the following conditions and specifications.

[0226] Column: "HP-1" manufactured by Hewlett Packard

...

manufacture example 1

[0232] Production Example 1: Production of Resin Solution P-1

[0233] Add 50 parts of dimethylaminoethyl methacrylate, 25 parts of dodecyl methacrylate, 25 parts of 200 parts of tert-butyl methacrylate and 200 parts of absolute ethanol, add 0.2 parts of dimethyl 2,2'-azobisisobutyrate, heat to 80°C under nitrogen flow while stirring, and react for 8 hours to obtain copolymerization substance solution. The copolymer had a weight average molecular weight (in terms of polystyrene) of 100,000 as determined by GPC (gel permeation chromatography) analysis using polystyrene as a standard substance.

[0234] Then, using a dropping funnel, dropwise add hydrogen peroxide (using 34% hydrogen peroxide) equimolar to the added dimethylaminoethyl methacrylate in the solution obtained above in 1 hour, and then, under nitrogen flow, , Heated to reflux at the boiling point for 12 hours to carry out the oxidation reaction of dimethylamino. In addition, the terminal point of the above-mention...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
boiling pointaaaaaaaaaa
Login to View More

Abstract

Disclosed are an amine oxide group-containing resin solution and a resin composition for a hair cosmetic preparation, comprising the resin solution. The resin solution and the resin composition are free from a problem of coloring or discoloration with the elapse of time. The amine oxide group-containing resin solution and the resin composition for a hair cosmetic preparation prepared using the resin solution satisfy the requirement that, for a sample solution prepared from the amine oxide group-containing resin solution and comprising 18% by weight of an amine oxide group-containing resin, 10% by weight of water, and 72% by weight of ethanol, the difference (da) between value a (a0) in an Lab color system and the maximum value (amax) of values a after exposure of the sample solution to ultraviolet light is not more than 5, and the requirement that, for the sample solution, the difference (db) between value b (b0) and value b (bm) when the sample solution exhibits the maximum value (amax) is not more than 9.

Description

[0001] This application is a divisional application of the PCT international application PCT / JP2009 / 062915 with an application date of July 16, 2009. The original application is an invention patent application, and the application number entering the national phase is 200980000281.8. solution and a resin composition for hair cosmetics using the solution". technical field [0002] The present invention relates to an amine oxide group-containing resin solution containing an amine oxide group-containing resin, and more particularly, the present invention relates to an amine oxide group-containing resin solution in which coloration over time is suppressed. It also relates to a resin composition for hair cosmetics prepared using the amine oxide group-containing resin solution. Background technique [0003] Conventionally, as resins for hair cosmetics, amine oxide group-containing resins are known to exhibit good water solubility, can be freely diluted with water, and have excelle...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/34C08F220/18C08F8/06A61K8/81A61Q5/00A61Q5/12A61Q5/06A61Q5/04A61Q5/02
CPCA61Q5/06C08F220/34C08F2220/1883A61K8/8152C08F2220/1825A61Q5/00A61Q5/12C08F220/1804C08F220/1812
Inventor 川口重兴
Owner MITSUBISHI CHEM CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com