Method for preparing micro-nano structure on material surface based on laser interference photolithography

Abstract

The invention belongs to the technical field of electronics, and particularly relates to a method for preparing a micro-nano structure on a material surface based on laser interference photolithography. The micro-nano structure is formed on photoresist by generation of laser interference, so as to transfer the micro-nano structure on the photoresist to the material surface of a substrate with an etching method, and form the structures such as micro-nano-scale gratings, dot matrixes and linear arrays. By adoption of the method disclosed by the invention, high-quality nano structures can be produced in a large area on various material surfaces. The method disclosed by the invention is simple and convenient, is low in cost and has a great application value.

Description

technical field [0001] The invention belongs to the field of electronic technology, and in particular relates to a method for fabricating a micro-nano structure on a material surface by using laser interference lithography. Background technique [0002] Fabricating micro-nano structures with specific structures on the surface of materials has always been the focus of research in the field of microelectronics and nanoscience. However, due to the size limitation and high cost of traditional photolithography methods, it is impossible to mass-produce micro-nano patterns with large areas and flexible periodic scales. , and the fabrication of these specific periodic structures is a core technology in the fields of microelectronic device fabrication, biomedicine, and electronic detection. Therefore, low-cost mass production of large-area micro-nano structures has extremely high market value. [0003] The method of laser interference lithography has incomparable advantages in the ma...

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Problems solved by technology

[0002] Fabricating micro-nano structures with specific structures on the surface of materials has always been the focus of research in the field of microelectronics and nanoscience. However, due to the size limitation and high cost of traditional photolithography methods, it is impossible to mass-produce micro-nano patterns with large areas and flexible periodic scales. , and the fabrication of these specific periodic structures is a core technology in the fields of microelectronic device fabrication, biomedicine, and electronic detection, so low-cost mass production of large-area micro-nano structures has extremely high market value

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