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Sol-gel preparation method for hydrophobic mesoporous silicon dioxide film

A silicon dioxide film and hydrophobic technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of poor hydrophobic modification effect and mesoporous structure damage, and achieve good hydrophobicity, easy operation, and simple preparation method Effect

Inactive Publication Date: 2012-10-31
KUNSHAN ZHIJI MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the shortcomings of existing methods such as poor hydrophobic modification effect, easy to cause mesoporous structure damage during high temperature treatment, and provide a sol-gel method for preparing hydrophobic mesoporous silica membranes.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0024] Weigh 0.08g cetyltrimethylammonium bromide and dissolve it in 100ml ethanol and dissolve it in a certain volume of ethanol to form a solution;

[0025] Add 3 ml of ethyl orthosilicate and methyl triethoxy silicon mixed at a molar ratio of 1:3, and stir at room temperature for 1 h;

[0026] Add a certain volume ratio of 1:2:3 mixed HNO 3 , a mixed solution of ethanol and water 30ml;

[0027] The solution was placed in a constant temperature water bath to reflux for 4 hours, and then aged at room temperature for 10 hours to obtain SiO 2 Sol;

[0028] The resulting sol was used as a coating solution, and the dip-coating method was used to coat SiO on smooth glass sheets that had been pickled and alcohol-washed. 2 film;

[0029] The film was dried naturally at room temperature for 5 hours, and then moved into a constant temperature oven at 60°C for 15 hours;

[0030] The dried film was transferred into a temperature-programmed tube furnace (N 2 atmosphere), and calcin...

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PUM

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Abstract

The invention aims to overcome the defects of poor hydrophobic modification effect, easiness in causing mesoporous structure damages during high-temperature treatment, and the like existing in the conventional method, and provides a sol-gel production process for preparing a hydrophobic mesoporous silicon dioxide film. The process has the advantages of simple experimental equipment, convenience for operating, ready availability of raw materials, low energy consumption, low cost, and industrial popularization and practical application values. The mesoporous silicon dioxide film disclosed by the invention has a good mesoporous structure and high hydrophobicity. The average pore diameter of the obtained hydrophobic mesoporous silicon dioxide film is 8 nanometers, the pore volume is 0.8g / cm<-3>, and the contact angle is up to 115 degrees. The improvement on the hydrophobicity of the mesoporous silicon dioxide film is an effective means for improving the performance, popularizing and applying.

Description

[technical field] [0001] The invention relates to the technical field of semiconductors, in particular to a sol-gel preparation method of a hydrophobic mesoporous silicon dioxide film. [Background technique] [0002] There are a large number of surface hydroxyl groups on the surface of the mesoporous silica membrane. These hydroxyl groups are active physical adsorption centers. They can easily absorb water molecules through hydrogen bonds to form a water molecular film on the surface of the pores, and further polycondensation will occur between the mesoporous membrane and water. The reaction eventually leads to the collapse of the pore structure, which affects its industrial application. Therefore, improving the hydrophobicity of mesoporous silica membranes is an effective way to improve their performance and popularize their applications. At present, there are two main methods to improve the hydrophobicity of mesoporous silica membranes: one is to eliminate the hydroxyl gr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12C03C17/23
Inventor 沈杰
Owner KUNSHAN ZHIJI MATERIAL TECH
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