Method for processing metal film strainometer based on MEMS (Micro-electromechanical Systems)
A metal film, strain gauge technology, applied in metal material coating process, process for producing decorative surface effects, electric/magnetic solid deformation measurement, etc. Strain measurement and low power consumption measurement, to achieve the effect of miniaturization, realization of point stress and torque, and improved sensitivity
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[0026] Specific implementation examples
[0027] The metal film strain gauge based on MEMS to be prepared in this embodiment is as Image 6 As shown, it includes a bow-shaped strain gauge sensitive grid and anchor points at both ends of the sensitive grid; the material of the strain gauge sensitive grid is Ni–Cr alloy, and the material of the strain gauge anchor point is AL.
[0028] Corresponding respectively figure 1 (a)-(k), the processing method of the metal film strain gauge based on MEMS in the present embodiment, comprises the steps:
[0029] Step 1, cleaning the silicon wafer 1, removing the native oxide layer and organic contamination on the surface, and then drying. The thickness of ordinary silicon wafer is 200μm, such as figure 1 (a);
[0030] Step 2, use the silicon wafer 1 as the substrate to spin-coat PDMS, cure at 65°C for 1 hour, and use it as the adhesive layer 2, such as figure 1 (b);
[0031] The PDMS is mixed with the PDMS prepolymer and the curing a...
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