Monocrystalline silicon wafer pre-cleaning method
A single-crystal silicon wafer and pre-cleaning technology, applied in the field of cleaning technology, can solve the problems such as the inability to remove the dirty fingerprints of the single-crystal silicon wafer, the uneven quality of the single-crystal silicon wafer, and the impact on the product A yield rate, etc. The effect of shortening the texturing time, uniform suede and avoiding whitening
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Embodiment 1
[0017] ①. For the first liquid preparation, add 135 liters of deionized water into the process tank with a volume of 150 liters, heat the water temperature in the process tank and keep it at 65 degrees; then start the preparation of various chemicals, first add NaOH (Electronic grade) 250g, add H 2 o 2 About 6 liters, stir evenly with a long stick made of PP material, and get the dosing solution for use.
[0018] ②, cleaning, put the 125*125 monocrystalline silicon wafers into the carrying box, put multiple carrying boxes into the big flower blue one by one as a batch, and require the number of single crystal silicon wafers in each batch to be 300 Finally, put the big flower blue with the monocrystalline silicon wafer into the process tank equipped with the solution in ①, and control the soaking time to 200 seconds.
[0019] ③, rehydration, after each batch of cleaning, rehydration is required when cleaning the next batch, add H 2 o 2 0.8 liters, in the case of uninter...
Embodiment 2
[0021] ①. For the first liquid preparation, add 155 liters of deionized water into the process tank with a volume of 165 liters. The water temperature in the process tank is heated and kept at 65 degrees; then start the preparation of various chemicals, first add NaOH (Electronic grade) 275 grams, then add H 2 o 2 About 6 liters, stir evenly with a long stick made of PP material, and get the dosing solution for use.
[0022] ②, Cleaning, put the 125*125 monocrystalline silicon wafers into the carrier box, put multiple carrier boxes into the big flower blue in turn as a batch, and require the number of monocrystalline silicon wafers in each batch to be 400 Finally, put the big flower blue with the monocrystalline silicon wafer into the process tank with the solution in ①, and control the soaking time to 250 seconds.
[0023] ③, rehydration, after each batch of cleaning, rehydration is required when cleaning the next batch, add H 2 o 2 0.9 liters, in the case of uninterr...
Embodiment 3
[0025] ①. For the first dosing, add 160 liters of deionized water into the process tank with a volume of 180 liters. The water temperature in the process tank is heated and kept at about 65 degrees; then start the preparation of various chemicals, first add NaOH (electronic grade) 300 g, then add H 2 o 2 About 6 liters, stir evenly with a long stick made of PP material, and get the dosing solution for use.
[0026] ②, Cleaning, put the 125*125 monocrystalline silicon wafers into the carrier box, put multiple carrier boxes into the big flower blue in turn as a batch, and require the number of monocrystalline silicon wafers in each batch to be 400 slices, and finally put the indigo with monocrystalline silicon wafers into the process tank equipped with the solution in ①, and the soaking time is controlled at 300 seconds.
[0027] ③, rehydration, after each batch of cleaning, rehydration is required when cleaning the next batch, add H 2 o 2 1 liter, in the case of uninter...
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