Method for manufacturing organic thin film transistor realizing patterning and automatic-modification interface in one step
A patterned, organic semiconductor technology that can be used in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., and can solve problems such as carrier traps
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[0042] (3) Fabrication of organic thin film transistors
[0043] Drop film standing method:
Embodiment 1
[0045] Dissolve Tips-pentacene and polystyrene (PS) at a ratio of 80% / 20% in chlorobenzene at 40°C, let it stand and filter to make a solution with a concentration of 3%, and then homogenize the solution Drop it onto the surface-selectively treated silicon wafer with gold electrodes at an inclination angle of 15°-30°, let it stand until the film is uniform, and post-bake it on a hot stage at 120°C for 30 minutes to prepare a film.
Embodiment 2
[0047] Dissolve Tips-pentacene and polystyrene (PS) at a ratio of 60% / 40% in chlorobenzene at 40°C, let it stand and filter to make a solution with a concentration of 3%, and then homogenize the solution Drop it onto the surface-selectively treated silicon wafer with gold electrodes at an inclination angle of 15°-30°, let it stand until the film is uniform, and post-bake it on a hot stage at 120°C for 30 minutes to prepare a film.
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