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Thermal treatment method for nanometer tantalum powder

A heat treatment method and nano-tantalum technology, applied in the field of tantalum powder production, to achieve the effect of short treatment time, avoid violent oxidation or even combustion, and prevent oxidation

Inactive Publication Date: 2014-01-29
NO 52 INST OF CHINA NORTH IND GRP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no relevant research report on the heat treatment method of nano-scale tantalum powder at home and abroad.

Method used

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  • Thermal treatment method for nanometer tantalum powder

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Experimental program
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Effect test

Embodiment 1

[0031] A kind of heat treatment method of nanometer tantalum powder of the present invention, comprises the following steps:

[0032] (1) Preparation of Nano Tantalum Powder

[0033] The raw tantalum powder is fed into the induction plasma pulverization equipment (TEKNA TIU-40) at a rate of 4g / min. The pressure of the reaction chamber of the induction plasma pulverization equipment is 85KPa, and the flow rate of argon gas in the inner layer is 0.75 standard liters / min (as Excited gas and can generate plasma atmosphere), the outer gas flow rate is 1.5 standard liters / min of argon and 0.67 standard liters / min of hydrogen (cooling gas and can generate plasma atmosphere), and the average particle size is 57nm under the condition of plasma power 45KW Nano tantalum powder (such as figure 1 shown);

[0034] (2) Preparation of nano-tantalum powder compact

[0035] The nano-tantalum powder obtained in step (1) is directly sent into the glove box which is sealed and connected with th...

Embodiment 2

[0043] A kind of heat treatment method of nanometer tantalum powder of the present invention, comprises the following steps:

[0044] (1) Preparation of Nano Tantalum Powder

[0045] The raw tantalum powder is fed into the induction plasma powder making equipment at a rate of 5g / min. The pressure of the reaction chamber of the induction plasma powder making equipment is 95KPa, and the flow rate of argon gas in the inner layer is 0.85 standard liters / min (as an exciting gas and can generate plasma Atmosphere), the outer gas flow rate of argon gas is 1.5 standard liters / min and hydrogen gas is 0.67 standard liters / min (cooling gas and plasma atmosphere can be generated), and the nano-tantalum powder with an average particle size of 45nm is obtained under the condition of plasma power 60KW;

[0046] (2) Preparation of nano-tantalum powder compact

[0047] The nano-tantalum powder obtained in step (1) is directly sent into the glove box which is sealed and connected with the indu...

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Abstract

The invention relates to a thermal treatment method for nanometer tantalum powder. The thermal treatment method comprises the following steps: sending nanometer tantalum powder into a sensing plasma powder production equipment with the rate of 4-5g / min for preparation to obtain nanometer tantalum powder with average particle size being 40-60nm; directly sending the nanometer tantalum powder into a sealed glove box, and filling the tantalum powder into a die to be made into a tantalum powder briquette with density of 2-5g / cm3; treating the tantalum powder briquette for 10-60min under the conditions of protection of 0.08MPa high-purity argon atmosphere and temperature of 600-1200 DEG C; and smashing the nanometer tantalum powder briquette and then uniformly mixing the nanometer tantalum powder with reducible metal powder in a high-energy ball mill, treating the mixture for 2-4h under the conditions of temperature of 600-1000 DEG C and pressure of 1*10<-3>Pa, and washing and drying to obtain the agglomerated nanometer tantalum powder. The thermal treatment method of the invention has the advantages that the thermal treatment method for nanometer tantalum powder is disclosed for the first time and the method can reduce oxygen content and improve the fluidity of oxygen.

Description

technical field [0001] The invention relates to the field of tantalum powder production, in particular to a heat treatment method for nanometer tantalum powder. Background technique [0002] The core component of a tantalum capacitor is made of tantalum powder. Tantalum capacitors have the advantages of small size, large capacity, high reliability, long life, and can work normally under severe conditions. They are widely used in high-end electronic products such as computers and cameras. As the size of electronic products continues to decrease and their functions become more and more powerful, tantalum capacitors are gradually developing in the direction of miniaturization, sheet type, and high capacity. Under the condition of the same quality of tantalum powder, the only way for tantalum capacitors to obtain larger capacitance is to reduce the particle size of tantalum powder before sintering, while ensuring that the tantalum powder has good fluidity and a very low oxygen ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B22F1/00
Inventor 邹敏明尚福军黄伟刘勇田开文史洪刚梁栋
Owner NO 52 INST OF CHINA NORTH IND GRP CORP
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