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Device for measuring optical non-linearity of material by single-pulse flat-top light and measuring method thereof

An optical nonlinear, flat-top light technology, applied in transmittance measurement, phase influence characteristic measurement, etc., can solve the problem of inability to meet the measurement requirements, and achieve the effect of convenient measurement device, high measurement sensitivity, and reduced measurement cost.

Inactive Publication Date: 2012-07-04
SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The measurement sensitivity of this method is the same as that of the general measurement method. Under certain conditions, it cannot meet the measurement requirements.

Method used

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  • Device for measuring optical non-linearity of material by single-pulse flat-top light and measuring method thereof
  • Device for measuring optical non-linearity of material by single-pulse flat-top light and measuring method thereof
  • Device for measuring optical non-linearity of material by single-pulse flat-top light and measuring method thereof

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0028] The optical path of the device of the invention is composed of a beam splitter, a convex lens, a small hole, a baffle and a detector; the pulse laser is focused on the sample to be tested.

[0029] Such as figure 1 As shown, the device includes:

[0030] A beam expander system, the beam expander system is composed of a first convex lens 2 and a second convex lens 3, and the first convex lens 2 and the second convex lens 3 are placed left and right in the horizontal direction.

[0031] Measuring system, described measuring system is made up of pinhole 4, the 3rd convex lens 7, the 2nd beam splitter 9, the 4th convex lens 10, the 2nd detector 11, circular pinhole 12, circular baffle plate 13, the 5th convex lens 14 and the third detector 15, in the horizontal direction, on the right side of the second convex lens 3, the small hole 4, the third convex lens 7, the sample to be tested 8, the circular small hole 12, the circular baffle 13. The fifth convex lens 14 and the t...

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Abstract

The invention discloses a device for measuring optical non-linearity of a material by single-pulse flat-top light. A round small hole and a round baffle are arranged in a light path of a detection light after passing through a specimen, and the nonlinear transmittance of the open pore as well as the far-field round small hole and the round baffle combination is measured by the measuring method under the action of single-pulse, so as to determine the nonlinear absorption and nonlinear refraction coefficients of the material. When the measuring device works, the measuring system is simple in light path, the measuring sensitivity is extraordinary high, the data processing is simple, single pulse measuring is realized, the specimen is not needed to be moved, nonlinear absorption and nonlinear refraction can be simultaneously measured, and the measuring cost is greatly reduced.

Description

technical field [0001] The invention relates to a device for measuring optical nonlinearity of materials with high-sensitivity single-pulse flat-hat light, which belongs to the field of nonlinear photonic materials and nonlinear optical information processing. The invention also relates to a measurement method for the above-mentioned device. Background technique [0002] With the rapid development of technologies in the fields of optical communication and optical information processing, the research on nonlinear optical materials is becoming increasingly important. The realization of functions such as optical logic, optical memory, optical transistor, optical switch and phase complex conjugation mainly depends on the research progress of nonlinear optical materials. Optical nonlinear measurement technology is one of the key technologies for studying nonlinear optical materials. Commonly used measurement methods include Z-scan, 4f system coherent imaging technology, Mach-Ze...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/59G01N21/41
Inventor 宋瑛林杨俊义刘南春吴幸智杨勇
Owner SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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