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Radial air floatation guide module and photoetching machine motion platform applying same

A motion platform and air flotation-guided technology, which is applied in micro-lithography exposure equipment, mechanical equipment, photo-plate-making process exposure devices, etc., can solve the problems of the overall rigidity limitation of the motion platform, and achieve the effect of ensuring rigidity

Inactive Publication Date: 2012-07-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the air bearing structure only exists on one side, the overall stiffness of the motion platform will be limited

Method used

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  • Radial air floatation guide module and photoetching machine motion platform applying same
  • Radial air floatation guide module and photoetching machine motion platform applying same
  • Radial air floatation guide module and photoetching machine motion platform applying same

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Embodiment Construction

[0030] figure 1 Shown is a schematic diagram of a motion platform of a photolithography machine according to a preferred embodiment of the present invention. Please refer to figure 1 . In this embodiment, the motion platform 1 of the lithography machine is used to drive the workpiece 2 to move. The workpiece 2 can here be a silicon wafer. However, the present invention does not make any limitation thereto. In other embodiments, the workpiece 2 can also be a glass substrate.

[0031] In this embodiment, the motion platform 1 of the lithography machine includes a base 10, a support 11, a micro-motion table 12, a Z-direction driving device, a gravity compensation unit 15, a vacuum block 16, an air floating block 17, and a coarse motion ring 18 , rotating motor 19, carrier 20, radial air bearing guide module 3, X guide rail 23, X guide linear motor 24, two air bearing slides 25, two Y guide guide rails 26, two Y guide linear motors 27, Two shuttles 28 and two displacement me...

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Abstract

The invention provides a radial air floatation guide module and a photoetching machine motion platform applying the same. The radial air floatation guide module is arranged on a micropositioner and comprises a ring stator and a plurality of flexible hinges, wherein the ring stator is provided with an air flotation guide part, and the micropositioner moves by taking the air flotation guide part as guidance; and the plurality of flexible hinges are uniformly fixed on the micropositioner, and each flexible hinge is respectively provided with a fixing part, a flexible part and an air floatation part, wherein the fixing part is fixed on the micropositioner, the flexible part is connected with the fixing part and the air floatation part, the air floatation part faces to the air flotation part, and a uniform compressed air layer can be formed between the air floatation part and the air flotation guide part. According to the radial air floatation guide module provided by the invention, radial air floatation guidance is realized by using the flexible hinges, not only the rigidity of the radial air floatation guide module in the horizontal direction is ensured, but also reduction of difficulty in design, processing and assembly of the radial air flotation guide module is facilitated.

Description

technical field [0001] The invention relates to an air-floating guiding module, and in particular to a radial air-floating guiding module and a motion platform of a lithography machine using the same. Background technique [0002] The worktable of the lithography machine mainly carries workpieces such as silicon wafers or glass substrates to move synchronously with the mask table under the objective lens, and completes precise exposure work. [0003] European Patent No. EP 0729073 discloses a six-degree-of-freedom motion platform for silicon wafer exposure. The micro-motion stage of the motion platform can realize four-degree-of-freedom motion including moving along the Z axis, and rotating around the X axis, Y axis, and Z axis. Among them, the motion guidance of moving along the Z axis and rotating around the Z axis is realized in the form of a ring air bearing. The disadvantage of this method is that the movement around the X-axis and Y-axis needs to squeeze the air bear...

Claims

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Application Information

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IPC IPC(8): F16C32/06G03F7/20
Inventor 秦磊朱岳彬
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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