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Atmosphere isolation device between vacuum chambers

A technology of isolation device and vacuum chamber, which is applied in vacuum evaporation plating, electrical components, ion implantation plating, etc., can solve the problems of uneven film layer, impact, increase equipment complexity and cost, etc., and achieve good isolation effect, The effect of reducing equipment cost and complexity

Inactive Publication Date: 2012-07-04
SHANGHAI INST OF SPACE POWER SOURCES
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0006] Using a single air-sealing technology requires a large flow rate to ensure no mutual interference, wasting a lot of gas, and at the same time, an excessive flow rate also impacts the atmosphere of the reaction chamber, making the plated film layer uneven
However, using a single differential or multiple differentials requires increasing the number of isolation chambers and air pumps, increasing the complexity and cost of the equipment

Method used

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Embodiment Construction

[0023] The feature of the present invention is that it combines the gas sealing technology and the differential technology while avoiding the design of the isolation chamber. The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0024] Such as image 3 As shown, the vacuum chamber atmosphere isolation device provided by the preferred embodiment of the present invention includes adjacent reaction chambers 301 and 302 , an air inlet 304 is provided on the slit 303 , gas mixing chambers 305 , 306 and an air extraction port 307 . The flexible substrate 308 is coated in different reaction chambers. The air inlet is filled with inert gas or gas shared by adjacent reaction chambers, such as H2 or N2, through the control of the mass flow meter. The pumping system of the pumping port 307 adopts a separate mechanical pump or a pumping system composed of a molecular pump and a mechanical pump. The gas flow rate of the gas inle...

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Abstract

The invention discloses an atmosphere isolation device between vacuum chambers. By combining an air seal technology and a difference technology, atmosphere among a plurality of vacuum chambers is isolated, and films are continuously coated on flexible substrates such as metal foil or plastic and the like so as to obtain a film material with ideal quality. Air inlets, air mixing chambers and air exhaust ports are formed on a slit between the vacuum chambers, air is blown through the air inlets, and is subjected to difference isolation by combining the air mixing chambers and forming the air exhaust ports, and atmosphere between two chambers can be prevented from being doped. The device can guarantee that two adjacent chambers can work in a state of large differential pressure, and a plurality of air inlets and a plurality of air mixing chambers can replace a plurality of isolation chambers, so manufacturing cost and complexity of equipment can be reduced greatly.

Description

technical field [0001] The invention belongs to the research in the field of new energy and solar cells, and relates to an atmosphere isolation device between vacuum chambers. Background technique [0002] When performing continuous coating on flexible substrates, multiple vacuum chambers are often required for different reaction depositions, so there must be a device to isolate two adjacent reaction vacuum chambers to avoid mutual contamination of atmospheres between different reaction chambers . Especially for silicon-based thin-film solar cells with flexible substrates, the N-type (n-type doped layer), I-type (intrinsic layer), and P-type (p-type doped layer) materials are grown in different reaction chambers. Ensure that the gases in the chambers do not interfere with each other. Traditional gas isolation technologies include hermetic sealing and differential isolation. [0003] The air-tight technology is to use the inflatable port to blow in the gas, and the gas ent...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/56C23C16/54H01L31/20
CPCY02P70/50
Inventor 叶晓军刘成周丽华李红波陈鸣波
Owner SHANGHAI INST OF SPACE POWER SOURCES
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