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Monitoring semiconductor substrate test structures and test methods for integrated passive devices

A technology for integrating passive devices and test structures, applied in semiconductor devices, semiconductor/solid-state device parts, electric solid-state devices, etc., can solve problems such as reducing inductance and Q coefficient, small resistivity, high-frequency signal loss, etc.

Active Publication Date: 2016-06-29
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Description
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  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the resistivity of semiconductor substrates usually used in the manufacture of semiconductor devices is relatively small (≤50Ωcm), so that high-frequency signals (such as radio frequency signals) will cause losses in the circuit; this is because the magnetic field penetrating the semiconductor substrate will cause losses and reduce the value of inductance and Q factor

Method used

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  • Monitoring semiconductor substrate test structures and test methods for integrated passive devices
  • Monitoring semiconductor substrate test structures and test methods for integrated passive devices
  • Monitoring semiconductor substrate test structures and test methods for integrated passive devices

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Embodiment Construction

[0019] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings.

[0020] figure 1 A test structure for monitoring a semiconductor substrate for integrating passive devices according to an embodiment of the present invention is schematically shown. Among them, passive components are used in high frequency applications.

[0021] in, figure 1 The middle right view shows a partial enlargement of the left view.

[0022] like figure 1 As shown, which shows a partial layout structure of the top metal layer, where M1-1 and M1-2 represent two metal lines in the top metal layer (first metal layer) of the semiconductor integrated circuit, and the first metal line M1- 1 and the second metal line M1-2. The areas of the first metal line M1 - 1 and the second metal line M1 - 2 are not specifically limited, for example, ...

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Abstract

The invention provides a semiconductor substrate testing structure and testing method for monitoring integrated passive devices. The test structure for monitoring a semiconductor substrate for integrating passive devices according to the present invention includes: the two ends of the semiconductor circuit on the semiconductor substrate that are connected to the two ends of the inductance, capacitance and resistance tester are separated by a specific distance. The first metal wire and the second metal wire, wherein a test signal is added to one end of the LCR tester to obtain a C-V curve, and the doping concentration of the semiconductor substrate is determined through the C-V curve. According to the test structure for monitoring semiconductor substrates used for integrated passive devices, the C-V curves reflect the characteristics of metal-oxide-substrate capacitors, and the characteristics of metal-oxide-substrate capacitors are as the semiconductor substrate is doped. The C-V curve reflects the doping concentration of the semiconductor substrate. Furthermore, the change of the resistivity of the semiconductor substrate can be judged by the doping concentration of the semiconductor substrate.

Description

technical field [0001] The invention relates to the field of semiconductor device manufacturing, more specifically, the invention relates to a semiconductor substrate test structure for monitoring integrated passive devices and a method for monitoring the semiconductor substrate test for integrated passive devices. Background technique [0002] In the semiconductor chip manufacturing process, for high-frequency (for example, not less than 2.4G) applications, it is necessary to integrate some passive devices in the circuit in many cases. [0003] For this process of integrating passive devices for high-frequency applications, a high-resistance semiconductor substrate can provide high Q and high inductance. Therefore, it is desirable to use high-resistance semiconductor substrates for processes integrating passive devices for high-frequency applications. [0004] However, the resistivity of semiconductor substrates usually used in the manufacture of semiconductor devices is r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/544G01N27/00G01R27/02
Inventor 韦敏侠黎坡唐莉孔蔚然许丹
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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